Measurements of Shubnikov-de Haas effect in highly enriched 28Si Hall bars

ORAL

Abstract

Elimination of unpaired nuclear spins can improve the fidelity of the quantum information; therefore, isotopically enriched 28Si is regarded as an ideal environment for quantum information processing devices. Using mass selected ion beam deposition technique, we in-situ enrich and deposit epitaxial 28Si and routinely achieving better than 99.99998 % 28Si isotope fractions. To explore the electrical properties and optimize the growth conditions of in-situ enriched 28Si, we fabricate top gated Hall bar devices, and investigate the magnetotransport in this material at magnetic fields as high as 12 T and temperature ranging from 20 K to 1.2 K. The data at low magnetic fields [endif]--> shows maximum mobilities of approximately 2500 cm2/Vs and 5000 cm2/Vs at an electron density of ≈ 2.5 x 1012 cm-2 for devices fabricated on 28Si and natural Si, respectively. Temperature dependence of Shubnikov-de Hass oscillations in longitudinal magnetoresistance (Rxx) at B > 2 T is used to extract the effective mass for charge carriers. Here, we report on the above device metrics, and compare to similar devices fabricated on natural Si.

Presenters

  • Aruna Ramanayaka

    National Institute of Standards and Technology

Authors

  • Aruna Ramanayaka

    National Institute of Standards and Technology

  • Hyun-soo Kim

    NIST -Natl Inst of Stds & Tech, National Institute of Standards and Technology

  • Ke Tang

    NIST -Natl Inst of Stds & Tech, National Institute of Standards and Technology

  • Joseph Hagmann

    National Institute of Standards and Technology, NIST -Natl Inst of Stds & Tech

  • Curt Richter

    National Institute of Standards and Technology, NIST -Natl Inst of Stds & Tech, NIST - National Inst. of Stands & Tech

  • M. Stewart Jr.

    NIST -Natl Inst of Stds & Tech, National Institute of Standards and Technology, National Institue of Standard and Technology

  • Joshua Pomeroy

    NIST -Natl Inst of Stds & Tech, National Institute of Standards and Technology, National Institue of Standard and Technology