300mm process line for qubit fabrication

The 300mm fabrication process is the backbone for advanced technology nodes in the semiconductor industry. State of the art transistors most complex integration schemes are only possible using the unique patterning capabilities, high quality material deposition, and process control that are maintained at these facilities. Intel is leveraging its 300mm fabrication expertise to create spin qubit circuits for quantum computing applications. This talk will focus on three aspects: materials, integration, and characterization. Intel has established a supply of high quality material which includes highly purified Si-28 for long coherence times. We also have created a multi-mask integration scheme which involves custom designed masks that allow fabrication of production quality quantum dots and spin qubits alongside reference transistors. We will be discussing some of the preliminary results from the 300 mm fab and lab line such as structures/features variation which is imperative for qubit devices.