Enhanced exciton-phonon scattering from monolayer to bilayer WS2

ORAL

Abstract

Layered 2D transition metal dichalcogenides like WS2 exhibit the emergence of a direct bandgap when the thickness is reduced down to a monolayer, along with the appearance of pronounced excitonic effects. The coherence lifetime of these tightly-bound excitons is fundamental to optoelectronic properties of the material. In high-quality samples, scattering with phonons is the chief mechanism that limits the coherence lifetime and defines the linewidth of excitonic transitions. While there has been much focus on the evolution of the band structure with thickness, the change in exciton coherence lifetime as the material transitions from a direct to an indirect gap semiconductor is not well understood. Here, we address this question with systematic measurements of temperature-dependent exciton linewidths in mono- and bilayer WS2. We find a significant increase in the A exciton linewidth in the bilayer compared to the monolayer, with room temperature linewidths ~50 meV broader in the former than in the latter, indicative of new scattering channels that produce dephasing on the 10 fs timescale. We will discuss these experimental results in terms of theoretical modeling of exciton phonon scattering processes present in the indirect-gap bilayer system, but absent in the monolayer.

Presenters

  • Archana Raja

    Berkeley University, Univ of California - Berkeley

Authors

  • Archana Raja

    Berkeley University, Univ of California - Berkeley

  • Malte Selig

    Technische Universität Berlin

  • Gunnar Berghäuser

    Chalmers University of Technology

  • Jaeeun Yu

    Columbia University

  • Heather Hill

    Engineering Physics, National Institute of Standards and Technology, National Institute of Standards and Technology, Physical Measurements Laboratory, National Institute of Standards and Technology, Physical Measurment Division, NIST, NIST -Natl Inst of Stds & Tech, NIST - National Institute of Standards and Technology

  • Albert Rigosi

    NIST -Natl Inst of Stds & Tech, NIST - National Institute of Standards and Technology, National Institute of Standards and Technology

  • Louis Brus

    Columbia University

  • Andreas Knorr

    Technische Universität Berlin

  • Ermin Malic

    Chalmers University of Technology

  • Tony Heinz

    Ginzton Lab, Stanford University, Stanford Univ, Applied Physics, Stanford University

  • Alexey Chernikov

    Universität Regensburg, Department of Physics, University of Regensburg