Graphene-based Planar Josephson Junction in Short and Ballistic Regime

ORAL

Abstract

Planar graphene-based Josephson junctions are prepared by the atomic edge contact of two closely arranged Al superconducting electrodes to h-BN encapuslated graphene. We first confirm the ballisticity of our junctions by the Fabry-Perot interference in both the normal and Josephson-coupled states. The IcRN product, a quality factor of Josephson coupling, almost reaches the theoretical limit (~2.4Δ0/e) of the short-and-ballistic Josephson coupling. But the T dependence of the junction Ic does not fit the conventional Kulik-Omel’yanchuk (KO) prediction in the short-and-ballistic regime. No exponentially decaying Ic(T) is observed with increasing temperature near Tc, which excludes the long-junction characteristics. Since the KO model is valid for a one-dimensional point-contact junction it is not relevant to our planar junctions. We confirm that Ic(T) fits well the short-and-ballistic Josephson coupling proposed by a recent theoretical model [1], which takes account of the spatial carrier inhomogeneity in graphene induced by the electronic doping near the superconducting electrodes.
[1] Y. Takane, K.-I. Imura, J. Phys. Soc. Jpn. 81, 094707 (2012).

Presenters

  • Jinho Park

    POSTECH

Authors

  • Jinho Park

    POSTECH

  • Jae-Hyeong Lee

    POSTECH

  • Gil-Ho Lee

    Department of Physics, POSTECH, Physics, Pohang University of Science and Technology, POSTECH

  • Yositake Takane

    Hiroshima University

  • Ken-Ichiro Imura

    Hiroshima University

  • Takashi Taniguchi

    National Institute for Materials Science, NIMS, National Institute for Material Science, Advanced Materials Laboratory, National Institute for Materials Science, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science (NIMS, Advanced Materials Laboratory, NIMS, National Institute for Materials Science, Advanced Materials Laboratory, National Institue for Materials Science, National Institute of Material Science, National Institute for Matericals Science, Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, NIMS-Japan

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, National Institute for Material Science, Advanced Materials Laboratory, National Institute for Materials Science, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science (NIMS, Advanced Materials Laboratory, NIMS, National Institute for Materials Science, Advanced Materials Laboratory, National Institue for Materials Science, National Institute of Material Science, National Institute for Matericals Science, Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, Advanced materials laboratory, National institute for Materials Science, NIMS-Japan

  • Hu-Jong Lee

    Pohang Univ of Sci & Tech, POSTECH