Gate-Tunable Photomemory Effect in MoS2 Transistors
ORAL
Abstract
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Presenters
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Andreij Gadelha
Physics, Univ Fed de Minas Gerais
Authors
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Andreij Gadelha
Physics, Univ Fed de Minas Gerais
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Alisson Cadore
Physics Department, Institute of Exact Sciences - UFMG, Physics, Univ Fed de Minas Gerais
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Kenji Watanabe
National Institute for Materials Science, NIMS, National Institute for Material Science, Advanced Materials Laboratory, National Institute for Materials Science, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science (NIMS, Advanced Materials Laboratory, NIMS, National Institute for Materials Science, Advanced Materials Laboratory, National Institue for Materials Science, National Institute of Material Science, National Institute for Matericals Science, Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, Advanced materials laboratory, National institute for Materials Science, NIMS-Japan
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Takashi Taniguchi
National Institute for Materials Science, NIMS, National Institute for Material Science, Advanced Materials Laboratory, National Institute for Materials Science, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science (NIMS, Advanced Materials Laboratory, NIMS, National Institute for Materials Science, Advanced Materials Laboratory, National Institue for Materials Science, National Institute of Material Science, National Institute for Matericals Science, Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, NIMS-Japan
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Ana de Paula
Physics, Univ Fed de Minas Gerais
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Leandro Malard
Physics, Univ Fed de Minas Gerais
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Rodrigo Gribel Lacerda
Physics, Univ Fed de Minas Gerais
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Leonardo Campos
Physics Department, Institute of Exact Sciences - UFMG, Physics, Univ Fed de Minas Gerais