Imaging Bulk and Edge Transport near the Dirac Point in Graphene Moiré Superlattices

ORAL

Abstract

Van der Waals structures formed by aligning graphene monolayers with hexagonal boron nitride exhibit a moiré superlattice and broken sublattice symmetry that opens a gap at the Dirac point. The electrical conductivity is thermally activated at high temperature and saturates at low temperature indicating the existence of subgap states [1]. Transport via such states both in the bulk [2] and at the edges [3] have been suggested. We present a scanning gate microscopy study of moiré superlattice devices with similar gap size but different charge disorder. In the device with high charge impurity (~1010 cm-2) and low saturated resistivity (~10 kΩ) at the Dirac point we observe a clear response at the edges. Combined with simulations, we interpret the response as a result of enhanced edge doping. In addition, a device with low charge impurity (~109 cm-2) and high resistivity (~100 kΩ) shows bulk response only, consistent with the absence of edge-state shunting [3]. Our results provide microscopic insight into edge conduction that can be helpful in understanding transport in gapped Dirac systems. [1] Hunt et al. Science. 21, 1427-1430 (2013) [2] Gorbachev et al. Science. 24, 448-451 (2014) [3] Zhu et al. Nat. Commun. 8, 14552 (2017)

Presenters

  • Ziwei Dou

    Department of Physics, University of Cambridge, Univ of Cambridge

Authors

  • Ziwei Dou

    Department of Physics, University of Cambridge, Univ of Cambridge

  • Sei Morikawa

    Univ of Tokyo, Univ. of Tokyo

  • Alessandro Cresti

    Univ. Grenoble Alpes, CNRS, Grenoble INP, IMEP-LaHC

  • Shu-Wei Wang

    Department of Physics, University of Cambridge, Univ of Cambridge

  • Charles Smith

    Department of Physics, Cavendish Laboratory, University of Cambridge, JJ Thomson Avenue, Department of Physics, University of Cambridge, Univ of Cambridge

  • Christos Melios

    National Physical Laboratory

  • Olga Kazakova

    National Physical Laboratory

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, National Institute for Material Science, Advanced Materials Laboratory, National Institute for Materials Science, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science (NIMS, Advanced Materials Laboratory, NIMS, National Institute for Materials Science, Advanced Materials Laboratory, National Institue for Materials Science, National Institute of Material Science, National Institute for Matericals Science, Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, Advanced materials laboratory, National institute for Materials Science, NIMS-Japan

  • Takashi Taniguchi

    National Institute for Materials Science, NIMS, National Institute for Material Science, Advanced Materials Laboratory, National Institute for Materials Science, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science (NIMS, Advanced Materials Laboratory, NIMS, National Institute for Materials Science, Advanced Materials Laboratory, National Institue for Materials Science, National Institute of Material Science, National Institute for Matericals Science, Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, NIMS-Japan

  • Satoru Masubuchi

    Univ of Tokyo, Univ. of Tokyo

  • Tomoki Machida

    Univ of Tokyo, Univ. of Tokyo

  • Malcolm Connolly

    Department of Physics, Cavendish Laboratory, University of Cambridge, JJ Thomson Avenue, Department of Physics, University of Cambridge, Univ of Cambridge, Niels Bohr Institute, Univ of Copenhagen