Structural Sources of Electronic Disorder in GaAs Quantum Devices

ORAL

Abstract

The fabrication of quantum dots in GaAs/AlGaAs heterostructures involves the formation of metallic gate electrodes lithographically patterned on their surfaces. The gates are used for the definition and tuning of the electrostatic potential of the dot via applied voltages. We show using synchrotron x-ray nanobeam diffraction that the gates generate significant stresses that influence the operation of quantum devices. The stress is transferred through the metal/semiconductor interface to the depth where a two-dimensional electron gas (2DEG) forms, inducing unintentional lattice distortions to the active region of the device. The x-ray diffraction studies reveal lattice tilts on the order of 0.04° in the quantum dot region and strain up to 4×10-5 at the depth of the 2DEG. The piezoelectric effect in zinc-blende structures is the main source of electronic disorder with respect to the deformation potential which is an order of magnitude smaller. We estimate the piezoelectric potential induced by the lattice distortions to be approximately 10 mV. The strain leads to an energy shift of the minimum of the conduction band near the Γ point of GaAs due to the deformation potential by only 0.4 meV. The results indicate that such effects should be considered in the design of quantum devices.

Presenters

  • Anastasios Pateras

    Materials Science & Engineering, University of Wisconsin-Madison, Department of Materials Science and Engineering, University of Wisconsin-Madison

Authors

  • Anastasios Pateras

    Materials Science & Engineering, University of Wisconsin-Madison, Department of Materials Science and Engineering, University of Wisconsin-Madison

  • Joonkyu Park

    Materials Science & Engineering, University of Wisconsin-Madison

  • Youngjun Ahn

    Materials Science & Engineering, University of Wisconsin-Madison, Department of Materials Science and Engineering, University of Wisconsin-Madison

  • Jack Tilka

    Materials Science & Engineering, University of Wisconsin-Madison

  • Martin Holt

    Center for Nanoscale Materials, Argonne National Laboratory

  • Honghyuk Kim

    Electrical and Computer Engineering, University of Wisconsin-Madison

  • Luke Mawst

    Electrical and Computer Engineering, University of Wisconsin-Madison, Electrical and Computer Engineering, Univ Wisconsin-Madison

  • Werner Wegscheider

    ETH - Zurich, Solid State Physics Laboratory, ETH Zurich, ETH Zurich, Physics, ETH Zurich, Department of Physics, ETH Zurich, Laboratory for Solid State Physics, ETH Zürich, Laboratorium fur Festkrperphysik, ETH-Zurich, Laboratorium fur Festkorperphysik, , ETH-Zurich, ETH Zürich, Laboratorium für Festkörperphysik, ETH Zürich, Laboratorium fur Festkorperphysik, ETH-Zurich

  • Christian Reichl

    ETH - Zurich, Solid State Physics Laboratory, ETH Zurich, ETH Zurich, Physics, ETH Zurich, Department of Physics, ETH Zurich, Laboratory for Solid State Physics, ETH Zürich, Laboratorium fur Festkorperphysik, , ETH-Zurich, Laboratorium für Festkörperphysik, ETH Zürich

  • Timothy Baart

    QuTech and Kavli Institute of NanoScience, Delft University of Technology

  • J.P Dehollain

    QuTech and Kavli Institute of NanoScience, Delft University of Technology, QuTech and Kavli Institute of Nanoscience, TU Delft

  • Uditendu Mukhopadhyay

    QuTech & Kavli Institute of Nanoscience, TU Delft, QuTech and Kavli Institute of NanoScience, Delft University of Technology

  • Lieven Vandersypen

    Delft University of Technology, QuTech and Kavli Institute of Nanoscience, TU Delft, QuTech & Kavli Institute of Nanoscience, TU Delft, QuTech, Delft University of Technology, QuTech and Kavli Institute of NanoScience, Delft University of Technology, TU Delft

  • Paul Evans

    Materials Science & Engineering, University of Wisconsin-Madison