Graphene Josephson Junctions with Narrowly Defined Trenches

ORAL

Abstract

We present new results obtained from encapsulated graphene/boron-nitride heterostructure devices in which narrow trenches have been etched. These trenches are created both through e-beam lithography / reactive ion etching as well as through helium ion milling. We confirm cut widths on the order of tens of nanometers using scanning electron microscopy and atomic force microscopy. We report on several Josephson junction devices made by contacting these mesas with superconducting electrodes and demonstrate supercurrent in the quantum Hall regime. The dependence of this supercurrent on magnetic field is studied and compared to geometrical expectations.

–

Presenters

  • Andrew Seredinski

    Physics, Duke University, Duke University, Physics, Duke Univ

Authors

  • Andrew Seredinski

    Physics, Duke University, Duke University, Physics, Duke Univ

  • Anne Draelos

    Physics, Duke University, Duke University, Physics, Duke Univ

  • Ming-Tso Wei

    Physics, Duke University, Duke University, Physics, Duke Univ

  • Chung-Ting Ke

    Physics, Duke University, Duke University, Physics, Duke Univ

  • Tate Fleming

    Appalachian State University, Physics and Astronomy, Appalachian State University

  • Yash Mehta

    Appalachian State University, Physics and Astronomy, Appalachian State Univeristy, Physics and Astronomy, Appalachian State University

  • Ethan Mancil

    Appalachian State University, Physics and Astronomy, Appalachian State Univeristy, Physics and Astronomy, Appalachian State University

  • Hengming Li

    Appalachian State University, Physics and Astronomy, Appalachian State University

  • Takashi Taniguchi

    National Institute for Materials Science, NIMS, Advanced Materials Laboratory, National Institute for Materials Science, Chemical Engineering, Kyoto Univ, Advanced materials laboratory, National institute for Materials Science

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, National Institute for Material Science, Advanced Materials Laboratory, National Institute for Materials Science, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science (NIMS, Advanced Materials Laboratory, NIMS, National Institute for Materials Science, Advanced Materials Laboratory, National Institue for Materials Science, National Institute of Material Science, National Institute for Matericals Science, Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, Advanced materials laboratory, National institute for Materials Science, NIMS-Japan

  • Seigo Tarucha

    Department of Applied Physics, University of Tokyo, University of Tokyo, Department of Applied Physics, The University of Tokyo, Applied Physics, University of Tokyo, Applied Physics, The University of Tokyo

  • Michihisa Yamamoto

    Department of Applied Physics, University of Tokyo, University of Tokyo, JST, PRESTO, JST, Applied Physics, University of Tokyo

  • Ivan Borzenets

    Physics, City University of Hong Kong

  • Francois Amet

    Appalachian State University, Physics and Astronomy, Appalachian State Univeristy, Physics and Astronomy, Appalachian State University

  • Gleb Finkelstein

    Physics, Duke University, Duke University, Physics, Duke Univ