Observation of spontaneous high p-type doping on graphene-Talc heterostructure

ORAL

Abstract

Graphene, an atomically thick layer of carbon atoms arranged in a hexagonal lattice, has attracted a lot of interest in basic and in applied physics. With the advent of h-BN crystals, it is possible to improve graphene device quality and uncover many interesting quantum effects of Dirac fermions. On the other hand, heterostructures prepared using other 2D materials do not lead to considerable improvements of graphene devices quality, but they allow the development of other non-linear electronics elements. Here we report that an atomically flat graphene-talc heterostructure is spontaneously p-type doped up to n ~ 2.2 x 1013 cm-2 and show excellent charge mobility (~ 25,000 cm2V−1s−1). Raman investigation confirmed a preferential charge accumulation on graphene-talc rather than graphene on SiO2. In addition to potentially improving solar cell efficiency, graphene doping via van der Waals stacking is also a promising route towards controlling the band gap opening in bilayer graphene, promoting a steady n or p type doping in graphene and, eventually, providing a new path to access superconducting states in graphene, predicted to exist only at very high doping.

Presenters

  • Edrian Mania

    Physics Department, Institute of Exact Sciences - UFMG

Authors

  • Edrian Mania

    Physics Department, Institute of Exact Sciences - UFMG

  • Ananias Alencar

    Physics Department, Institute of Exact Sciences - UFMG

  • Alisson Cadore

    Physics Department, Institute of Exact Sciences - UFMG, Physics, Univ Fed de Minas Gerais

  • Bruno Carvalho

    Physics Department, Institute of Exact Sciences - UFMG

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, National Institute for Material Science, Advanced Materials Laboratory, National Institute for Materials Science, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science (NIMS, Advanced Materials Laboratory, NIMS, National Institute for Materials Science, Advanced Materials Laboratory, National Institue for Materials Science, National Institute of Material Science, National Institute for Matericals Science, Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, Advanced materials laboratory, National institute for Materials Science, NIMS-Japan

  • Takashi Taniguchi

    National Institute for Materials Science, NIMS, National Institute for Material Science, Advanced Materials Laboratory, National Institute for Materials Science, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science (NIMS, Advanced Materials Laboratory, NIMS, National Institute for Materials Science, Advanced Materials Laboratory, National Institue for Materials Science, National Institute of Material Science, National Institute for Matericals Science, Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, NIMS-Japan

  • Bernardo Neves

    Physics Department, Institute of Exact Sciences - UFMG

  • Helio Chacham

    Physics Department, Institute of Exact Sciences - UFMG, Department of Physics , Federal University of Minas Gerais, Physics, Federal University of Minas Gerais

  • Leonardo Campos

    Physics Department, Institute of Exact Sciences - UFMG, Physics, Univ Fed de Minas Gerais