Induced Robust Topological Order on an Ordinary Insulator Heterostructured with a Strong Topological Insulator

ORAL

Abstract

Three of V(Bi, Sb)-VI(Se, Te) binary compounds are predicted and confirmed to be strong topological insulators (STIs). The exception for Sb2Se3 to be an ordinary insulator (OI) is due to the weaker spin-orbit coupling. Here, we report that the rhombohedral phase of Sb2Se3 is successfully grown by molecular beam epitaxy on films of Bi2Se3 (an STI) and In2Se3 (an OI). Surface electronic structures of these heterostructures are investigated by angle-resolved photoemission spectroscopy. In the OI/STI heterostructure, a Dirac cone topological surface state (TSS) is found to be induced on the Sb2Se3 layer up to 15 nm thick, in sharp contrast with the OI/OI heterostructure where no sign of TSS can be observed.

Presenters

  • Bin LI

    Southern University of Science and Technology, The University of Hong Kong

Authors

  • Bin LI

    Southern University of Science and Technology, The University of Hong Kong

  • Qiangsheng Lu

    Southern University of Science and Technology

  • Shuigang Xu

    The Hong Kong University of Science and Technology

  • Xiangbin Cai

    The Hong Kong University of Science and Technology

  • YIPU XIA

    Physics, The University of Hong Kong, The University of Hong Kong

  • Wingkin Ho

    Physics, The University of Hong Kong, Department of Physics, The Univ of Hong Kong, The University of Hong Kong

  • Ning Wang

    Physics, Hong Kong Univ of Sci & Tech, The Hong Kong University of Science and Technology

  • Hailang Qin

    Southern University of Science and Technology

  • Gan Wang

    Southern University of Science and Technology, Physics, Southern University of Science and Technology

  • Chang Liu

    Southern University of Science and Technology, Physics, Southern University of Science and Technology

  • MAOHAI XIE

    Physics, The University of Hong Kong, Department of Physics, The Univ of Hong Kong, The University of Hong Kong, Department of Physics, The University of Hong Kong