Influence of Substrate on the Epitaxial Graphene on SiC
ORAL
Abstract
[1] J. Baringhaus et al. Nature 506, 349 (2014).
–
Presenters
-
Yiran Hu
School of Physics, Georgia Institute of Technology
Authors
-
Yiran Hu
School of Physics, Georgia Institute of Technology
-
Vladimir Prudkovskiy
CNRS-Inst. NEEL, Grenoble, France / Gatech-Physics, Institut Neel CNRS
-
Dogukan Deniz
School of Physics, Georgia Institute of Technology
-
Yue Hu
School of Physics, Georgia Institute of Technology
-
Jean-Philippe Turmaud
School of Physics, Georgia Institute of Technology
-
James Gigliotti
School of Materials Science and Engineering, Georgia Institute of Technology, Material Science and Engineering, Georgia Institute of Technology
-
Lei Ma
TICNN, Tianjin University
-
Claire Berger
CNRS-Inst. NEEL, Grenoble, France / Gatech-Physics, CNRS-Inst. Neel, Grenoble, France / Gatech-Physics, CNRS-Inst NEEL, Grenoble, France / Gatech Physics
-
Walt de Heer
Gatech-Physics, Atlanta, United States / Tianjin University-TICNN, Gatech-Physics / TICNN, Tianjin UNiversity, Gatech Physics, Atlanta, GA, United States / TICNN, Tianjin University