Electrically programmable quantum resistance standards with epitaxial graphene PN junctions

ORAL

Abstract

Epitaxial graphene has been identified as an excellent platform for resistance standards based on the quantum Hall effect (QHE) because of the wide plateaus and large breakdown current. The bipolar nature of graphene also allows it to be electrically gated to form PN junctions for convenient scaling of QHE-based resistance standards. We have fabricated top gated epitaxial graphene PN junction samples using hexgonal boron nitride (hBN) as dielectric materials and have measured the samples with highly accurate resistance bridges. The four terminal longitudinal resistance across a single junction is well quantized at h/e2 with an error of about 0.1 ppm on one edge and is around milli-ohm on the opposite edge. We have determined the optimal conditions where the breakdown current is maximized. Measurement using cryogenic current comparator is ongoing and array of PN junctions is under fabrication. Our work opens the possibility to realize high accuracy electrical resistance standards that are programmable using external gating.

Presenters

  • Jiuning Hu

    NIST -Natl Inst of Stds & Tech

Authors

  • Jiuning Hu

    NIST -Natl Inst of Stds & Tech

  • Mattias Kruskopf

    NIST -Natl Inst of Stds & Tech

  • Yanfei Yang

    NIST -Natl Inst of Stds & Tech, NIST

  • Chieh-W Liu

    NIST -Natl Inst of Stds & Tech

  • Chieh-I Liu

    NIST -Natl Inst of Stds & Tech

  • Jifa Tian

    NIST -Natl Inst of Stds & Tech

  • Biyi Wu

    NIST -Natl Inst of Stds & Tech

  • Albert Rigosi

    NIST -Natl Inst of Stds & Tech, NIST - National Institute of Standards and Technology, National Institute of Standards and Technology

  • George Jones

    NIST -Natl Inst of Stds & Tech, NIST

  • Alireza Panna

    NIST -Natl Inst of Stds & Tech

  • Marlin Kraft

    NIST -Natl Inst of Stds & Tech

  • Hsin Yen Lee

    NIST -Natl Inst of Stds & Tech

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, National Institute for Material Science, Advanced Materials Laboratory, National Institute for Materials Science, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science (NIMS, Advanced Materials Laboratory, NIMS, National Institute for Materials Science, Advanced Materials Laboratory, National Institue for Materials Science, National Institute of Material Science, National Institute for Matericals Science, Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, Advanced materials laboratory, National institute for Materials Science, NIMS-Japan

  • Takashi Taniguchi

    National Institute for Materials Science, NIMS, National Institute for Material Science, Advanced Materials Laboratory, National Institute for Materials Science, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science (NIMS, Advanced Materials Laboratory, NIMS, National Institute for Materials Science, Advanced Materials Laboratory, National Institue for Materials Science, National Institute of Material Science, National Institute for Matericals Science, Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, NIMS-Japan

  • Joseph Stroscio

    Center for Nanoscale Science and Technology, NIST, Center for Nanoscale Science and Technology, NIST -Natl Inst of Stds & Tech, NIST -Natl Inst of Stds & Tech, Center for Nanoscale Science and Technology, National Institue of Standards and Technology, Center for Nanoscale Science and Technology, National Institute of Standards and Technology, NIST

  • Randolph Elmquist

    NIST -Natl Inst of Stds & Tech, NIST, NIST - National Institute of Standards and Technology

  • David Newell

    NIST -Natl Inst of Stds & Tech, NIST - National Institute of Standards and Technology