Thru-thickness Vertically Ordered Lamellar Block Copolymer Films with Dynamic Thermal Annealing
ORAL
Abstract
Template-free directed self-assembly of ultrathin lamellar block copolymer (l-BCP) films into vertically oriented nanodomains holds much technological relevance for fabrication of next-generation devices from nanoelectronics to nanomembranes. We report the formation of thru-thickness vertically oriented lamellae in polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) thin films on quartz substrate, without any PMMA-block wetting layer formation, quartz surface modification or system modifications. A molecular relaxation induced vertical l-BCP ordering occurs under a transient macroscopic vertical strain field, imposed by sharp thermal gradient (▽T) cold zone annealing (CZA-S). The parametric window for vertical ordering is quantified via a coupling constant, C (= v.▽T), whose range is established in terms of ▽T above a threshold value, and an optimal dynamic sample sweep rate (v ~ d/τ), where τ = l-BCP’s longest molecular relaxation time and d = Tg,heat-Tg,cool distance. This study also reports a thorough understanding of the dynamic molecular mechanisms involved in the nanostructure formation and morphology evolution of vertically oriented l-BCP along the CZA-S ▽T tracked in real-time by in-situ GISAXS.
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Presenters
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Monali Basutkar
Polymer Engineering, The University of Akron
Authors
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Monali Basutkar
Polymer Engineering, The University of Akron
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Saumil Samant
Polymer Engineering, The University of Akron
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Joseph Strzalka
Division of X-ray Science, Argonne National Laboratory, X-ray Science Division, Argonne National Laboratory
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Kevin Yager
Center for Functional Nanomaterials, Brookhaven National Laboratory, Brookhaven National Laboratory, Brookhaven Natl Lab
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Gurpreet Singh
Polymer Engineering, The University of Akron
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Alamgir Karim
Polymer Engineering, The University of Akron, Chemical and Biomolecular Engineering, University of Houston