First principle calculations of phonon-limited electron mobility in GaN

ORAL

Abstract

For many advanced applications of GaN, electron mobility plays a key role in the device performance. Phonon strongly impacts electron scattering and thus electron mobility for a wide range of temperatures and carrier concentrations. However, the mechanism of electron-phonon scattering remains to be explored in GaN. Using density functional theory, we computed carrier scattering rate and transport properties for zinc blende n-type GaN with carrier concentration (n) of 1015 to 1019 cm-3 in the temperature range of 100 to 400 K. The calculated Hall mobility shows good agreement with experimental data. Furthermore, we found that the mobility remains the same for lightly doped (1015 < n < 1017 cm-3) cases, which is explained by values of the occupation numbers in scattering rate expression. We also found that electrons with mean free paths (MFPs) below 40 nm at n = 1017 cm-3 (30 nm at n = 1019 cm-3) provide dominant contribution to electron transport at 300 K, shedding light on GaN-related nanoengineering.

Presenters

  • Tianshi Wang

    Department of Materials Science and Engineering, Univ of Delaware

Authors

  • Tianshi Wang

    Department of Materials Science and Engineering, Univ of Delaware

  • Zhigang Gui

    Department of Materials Science and Engineering, Univ of Delaware, Univ of Delaware

  • Anderson Janotti

    Univ of Delaware, Department of Materials Science and Engineering, Univ of Delaware, University of Delaware, Departament of Materials Science and Engineering, University of Delaware, Department of Material science and Engineering, university of delaware, Department of Materials Science and Engineering, University of Delaware, Department of Materials Science & Engineering, University of Delaware

  • Chaoying Ni

    Department of Materials Science and Engineering, Univ of Delaware