Twist Dependent Resonant Tunneling in WSe2-based Heterostructures

ORAL

Abstract

We investigate interlayer tunneling in heterostructures consisting of two tungsten diselenide (WSe2) monolayers, separated by hexagonal boron nitride (hBN). In samples where the two WSe2 monolayers are rotationally aligned, we observe resonant tunneling, manifested by a large interlayer tunneling conductance (σIL) and negative differential resistance near zero interlayer bias (VIL), which stem from energy and momentum conserving tunneling. The strong spin-orbit coupling in monolayer WSe2 splits the valence band and leads to coupled spin-valley degrees of freedom. To probe the role of spin-valley in the interlayer tunneling current-voltage characteristics, we investigate two WSe2 layers separated by hBN with 0° and 180° relative twist between the WSe2 layers. In the 0°-twist samples, a large σIL peak appears at VIL = 0 V due to alignment of the like-valley-bands, i.e., the K valleys of the two WSe2 layers. In the 180°-twist samples, in which the K and K’ valleys in opposite layers are aligned in momentum space, we observe a negligible σIL at VIL = 0 V. Spin-valley conserved interlayer tunneling occurs when the like-valley-bands in the two layers are aligned, manifested as a large σIL at |VIL| = ±0.5 V.

Presenters

  • Kyounghwan Kim

    The University of Texas at Austin, Univ of Texas, Austin, Electrical and Computer Engineering, The University of Texas at Austin

Authors

  • Kyounghwan Kim

    The University of Texas at Austin, Univ of Texas, Austin, Electrical and Computer Engineering, The University of Texas at Austin

  • Hema Movva

    The University of Texas at Austin, Univ of Texas, Austin

  • Gregory Burg

    The University of Texas at Austin, Department of Electrical and Computer Engineering, The University of Texas at Austin, Electrical and Computer Engineering, The University of Texas at Austin

  • Stefano Larentis

    The University of Texas at Austin

  • Yimeng Wang

    The University of Texas at Austin

  • Takashi Taniguchi

    National Institute for Materials Science, NIMS, National Institute for Material Science, Advanced Materials Laboratory, National Institute for Materials Science, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science (NIMS, Advanced Materials Laboratory, NIMS, National Institute for Materials Science, Advanced Materials Laboratory, National Institue for Materials Science, National Institute of Material Science, National Institute for Matericals Science, Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, NIMS-Japan

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, National Institute for Material Science, Advanced Materials Laboratory, National Institute for Materials Science, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science (NIMS, Advanced Materials Laboratory, NIMS, National Institute for Materials Science, Advanced Materials Laboratory, National Institue for Materials Science, National Institute of Material Science, National Institute for Matericals Science, Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, Advanced materials laboratory, National institute for Materials Science, NIMS-Japan

  • Leonard Register

    The University of Texas at Austin, Electrical and Computer Engineering, The University of Texas at Austin

  • Emanuel Tutuc

    The University of Texas at Austin, Department of Electrical and Computer Engineering, The University of Texas at Austin, Univ of Texas, Austin, Electrical and Computer Engineering, The University of Texas at Austin