Quantitative Analysis of Surface Losses in Coplanar Waveguide Resonators Part 3: Surface Loss Extraction

ORAL

Abstract

Uniquely characterizing TLS defect layers around superconductors is challenging due to the nearly proportional scaling multiple of the defect layer participations in response to changes in geometry and anisotropic trench depth. We design a set of superconducting coplanar waveguide resonators utilizing deep isotropic etching into the silicon substrate to enable the extraction of independent surface losses. We then combine finite element electromagnetic simulations with statistical characterization of these isotropically etched resonators to determine the independent loss contribution from different interfaces for a high-Q TiN superconductor fabrication process. This characterization technique can be used to quantify the impact of process changes on individual defect layer losses and also as a general process monitor of multiple defect layer losses in co-fabricated superconducting qubit circuits.

Presenters

  • Wayne Woods

    MIT Lincoln Laboratory, MIT Lincoln Lab, Massachusetts Inst of Tech-MIT

Authors

  • Wayne Woods

    MIT Lincoln Laboratory, MIT Lincoln Lab, Massachusetts Inst of Tech-MIT

  • Alexander Melville

    MIT Lincoln Laboratory, MIT Lincoln Lab, Massachusetts Inst of Tech-MIT

  • Philip Krantz

    MIT Lincoln Laboratory, MIT Lincoln Lab, Massachusetts Inst of Tech-MIT, MIT

  • Rabindra Das

    MIT Lincoln Laboratory, MIT Lincoln Lab, Massachusetts Inst of Tech-MIT

  • Evan Golden

    MIT Lincoln Laboratory, MIT Lincoln Lab, Massachusetts Inst of Tech-MIT

  • Corey Stull

    MIT Lincoln Laboratory, MIT Lincoln Lab, Massachusetts Inst of Tech-MIT

  • Vlad Bolkhovsky

    MIT Lincoln Laboratory, MIT Lincoln Lab

  • Danielle Braje

    MIT Lincoln Laboratory, MIT Lincoln Lab

  • David Hover

    MIT Lincoln Laboratory, MIT Lincoln Lab

  • David Kim

    MIT Lincoln Laboratory, MIT Lincoln Lab, Lincoln Laboratory, Massachusetts Institute of Technology, Massachusetts Inst of Tech-MIT, Lincoln Laboratory, Massachusetts Inst of Tech-MIT

  • Xhovalin Miloshi

    MIT Lincoln Laboratory, MIT Lincoln Lab

  • Danna Rosenberg

    MIT Lincoln Laboratory, MIT Lincoln Lab, Massachusetts Inst of Tech-MIT, Lincoln Laboratory, Massachusetts Inst of Tech-MIT

  • Arjan Sevi

    MIT Lincoln Laboratory, MIT Lincoln Lab

  • Jonilyn Yoder

    MIT Lincoln Laboratory, MIT Lincoln Lab, Lincoln Laboratory, Massachusetts Institute of Technology, Massachusetts Inst of Tech-MIT, Lincoln Laboratory, Massachusetts Inst of Tech-MIT

  • Eric Dauler

    MIT Lincoln Laboratory, MIT Lincoln Lab

  • William Oliver

    MIT Lincoln Laboratory, MIT Lincoln Lab, Massachusetts Institute of Technology & MIT Lincoln Laboratory, Department of Physics, Research Laboratory of Electronics, Lincoln Laboratory, Massachusetts Institute of Technology, Massachusetts Inst of Tech-MIT, Department of Physics, Research Laboratory of Electronics, Lincoln Laboratory, Massachusetts Inst of Tech-MIT, MIT, Lincoln Laboratory, Research Laboratory of Electronics, and Department of Physics, Massachusetts Institute of Technology, Department of Physics, Research Laboratory of Electronics, Lincoln Laboratory, Massachusetts institute of Technology