Exploration of Alternate Fabrication and Processing Techniques for Superconducting Qubit Junctions
ORAL
Abstract
The performance of superconducting qubits can be significantly impacted by the fabrication process for forming the qubit junctions and shunt capacitance. Contamination and processing residues on the surfaces and interfaces can lead to substantial reductions in the coherence of superconducting qubits and quality factor of superconducting resonators. Therefore, it is of great importance to develop fabrication techniques that minimize such residues for producing high-quality qubits. In addition, we are exploring different lithographic approaches for achieving these goals. We present our ongoing efforts on alternate fabrication and processing techniques for superconducting qubit junctions.
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Presenters
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Yebin Liu
Physics, Syracuse Univ, Syracuse University, Syracuse Univ
Authors
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Yebin Liu
Physics, Syracuse Univ, Syracuse University, Syracuse Univ
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JJ Nelson
Syracuse Univ, Physics, Syracuse Univ, Syracuse University, Physics, Syracuse University
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Jaseung Ku
Physics, Syracuse Univ, Physics, Syracuse University, Syracuse Univ
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Britton Plourde
Syracuse Univ, Physics, Syracuse Univ, Syracuse University, Physics, Syracuse University