Exploration of Alternate Fabrication and Processing Techniques for Superconducting Qubit Junctions

ORAL

Abstract

The performance of superconducting qubits can be significantly impacted by the fabrication process for forming the qubit junctions and shunt capacitance. Contamination and processing residues on the surfaces and interfaces can lead to substantial reductions in the coherence of superconducting qubits and quality factor of superconducting resonators. Therefore, it is of great importance to develop fabrication techniques that minimize such residues for producing high-quality qubits. In addition, we are exploring different lithographic approaches for achieving these goals. We present our ongoing efforts on alternate fabrication and processing techniques for superconducting qubit junctions.

Presenters

  • Yebin Liu

    Physics, Syracuse Univ, Syracuse University, Syracuse Univ

Authors

  • Yebin Liu

    Physics, Syracuse Univ, Syracuse University, Syracuse Univ

  • JJ Nelson

    Syracuse Univ, Physics, Syracuse Univ, Syracuse University, Physics, Syracuse University

  • Jaseung Ku

    Physics, Syracuse Univ, Physics, Syracuse University, Syracuse Univ

  • Britton Plourde

    Syracuse Univ, Physics, Syracuse Univ, Syracuse University, Physics, Syracuse University