A universal trend in Hall coefficient and superconducting transition temperature in FeSe electric double layer transistors

ORAL

Abstract

Since the discovery of high-Tc superconductivity in monolayer FeSe on SrTiO3 [1], tremendous efforts have been addressed onto exploration of electronic origin for the high-Tc superconductivity using in-situ spectroscopic measurements. We have recently demonstrated ex-situ electrical transport measurements of the high-Tc FeSe with detailed thickness dependences using electrochemical etching technique in electric double layer transistor (EDLT) configuration [2]. In this talk, we will present a systematic thickness dependence of superconducting properties of FeSe-EDLT deposited on various oxide substrates. We found the universal relationship between the Hall coefficient and Tc, pointing out the importance of charge balance between electron and hole concentrations for emergence of high-Tc at 40 K [3]. We will also report on thickness dependences of the upper critical magnetic field and critical current density, both of which sharply increase towards thin film limit. The large values of the critical parameters clearly indicate the robustness of the high-Tc state in FeSe ultrathin films [1] Q. Y. Wang et al., Chin. Phys. Lett. 29, 037402 (2012). [2] J. Shiogai et al., Nature Phys. 12, 42 (2016). [3] J. Shiogai et al., Phys. Rev. B 95, 115101 (2017).

Presenters

  • Shiogai Junichi

    Institute for Materials Reaserch, Tohoku University, Tohoku Univ, IMR, Tohoku University, Institute for Materials Research

Authors

  • Shiogai Junichi

    Institute for Materials Reaserch, Tohoku University, Tohoku Univ, IMR, Tohoku University, Institute for Materials Research

  • Tomoki Miyakawa

    Institute for Materials Reaserch, Tohoku University

  • Takayuki Harada

    Institute for Materials Reaserch, Tohoku University

  • Tsutomu Nojima

    Institute for Materials Reaserch, Tohoku University, Tohoku Univ, Tohoku University, Tohoku Univ.

  • Atsushi Tsukazaki

    Institute for Materials Reaserch, Tohoku University, Tohoku Univ, Institute for Materials Research, Tohoku University, IMR, Tohoku University, Institute for Materials Research, Tohoku University, Tohoku Univ.