Controllable carrier doping and transport of van der Waals heterostructures

ORAL

Abstract

Two-dimensional (2D) materials of wide-ranging properties can now be simply stacked together to form van der Waals (vdW) heterostructures, offering enormous research opportunities. To explore unprecedented physical properties and enable functional electronic devices, local gates are usually used to modulate carrier concentration and implement various doping profiles in the 2D vdW heterostructures. However, the fabrication of local gate nanostructures requires sophisticated fabrication procedures that degrade the device quality and lack flexibility. Recent work has demonstrated an alternative way to induce nanoscale rewritable doping patterns in vdW heterostructures without introducing impurities by optical illumination or applying an STM tip voltage pulse. In this work we further develop this simple but efficient local patterning technique and study the low-temperature transport properties of patterned vdW heterostructures. Our results demonstrate that this technique offers distinct advantages over conventional local gates, making it an ideal approach for designing and prototyping novel device concepts.

Presenters

  • Wu Shi

    UC Berkeley and LBNL, UC berkeley, Univ of California - Berkeley

Authors

  • Wu Shi

    UC Berkeley and LBNL, UC berkeley, Univ of California - Berkeley

  • Salman Kahn

    UC Berkeley and LBNL

  • Sheng-Yu Wang

    UC Berkeley, Physics, University of California, Berkeley

  • Hsin-Zon Tsai

    UC Berkeley and LBNL

  • Dillon Wong

    Princeton University, Joseph Henry Laboratories & Department of Physics, Princeton University, UCB, Physics, Princeton University, Univ of California - Berkeley

  • Takashi Taniguchi

    National Institute for Materials Science, NIMS, National Institute for Material Science, Advanced Materials Laboratory, National Institute for Materials Science, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science (NIMS, Advanced Materials Laboratory, NIMS, National Institute for Materials Science, Advanced Materials Laboratory, National Institue for Materials Science, National Institute of Material Science, National Institute for Matericals Science, Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, NIMS-Japan

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, National Institute for Material Science, Advanced Materials Laboratory, National Institute for Materials Science, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science (NIMS, Advanced Materials Laboratory, NIMS, National Institute for Materials Science, Advanced Materials Laboratory, National Institue for Materials Science, National Institute of Material Science, National Institute for Matericals Science, Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, Advanced materials laboratory, National institute for Materials Science, NIMS-Japan

  • Michael Crommie

    Physics, Univ of California - Berkeley, UC Berkeley and LBNL, Univ of California - Berkeley, UCB, Physics, UC Berkeley, Physics, University of California, Berkeley, Department of physics, University of California - Berkeley, Physics, University of California - Berkeley

  • Alex Zettl

    UC Berkeley and LBNL, UC berkeley, Univ of California - Berkeley, Physics, UC Berkeley, Physics, University of California, Berkeley, University of California at Berkeley, Physics, University of California - Berkeley, Department of Physics, Univ of California - Berkeley