Thermal Desorption and Substrate Cleaning of Aluminum Superconducting Resonators

ORAL

Abstract

High quality resonators are critical to superconducting quantum computing architectures. We fabricate aluminum-on-silicon coplanar waveguide (CPW) resonators by means of e-beam lithography in ultra-high vacuum (UHV) conditions. We investigate the relative and cumulative effects of UHV thermal desorption and hydrofluoric acid (HF) cleaning of the silicon substrate prior to aluminum deposition. We characterize various resonators by measuring their internal quality factor as a function of power, temperature, and time. Our results indicate that e-beam deposited aluminum in UHV is competitive with molecular beam deposited aluminum, thus showing that long-lived superconducting quantum bits (qubits) can be fabricated using a single deposition tool.

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Presenters

  • Carolyn Earnest

    Institute for Quantum Computing, University of Waterloo, Institute for Quantum Computing

Authors

  • Carolyn Earnest

    Institute for Quantum Computing, University of Waterloo, Institute for Quantum Computing

  • Jérémy Béjanin

    Institute for Quantum Computing, University of Waterloo, Institute for Quantum Computing

  • Thomas McConkey

    Institute for Quantum Computing, University of Waterloo, Institute for Quantum Computing

  • Corey Rae McRae

    Institute for Quantum Computing, University of Waterloo, Institute for Quantum Computing

  • Evan Peters

    Institute for Quantum Computing, University of Waterloo

  • John Rinehart

    Institute for Quantum Computing, University of Waterloo, Institute for Quantum Computing

  • Matteo Mariantoni

    Institute for Quantum Computing, University of Waterloo, Institute for Quantum Computing, University of Waterloo