Metallicity at the Ioffe-Regal limit in a topological insulator thin film
ORAL
Abstract
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Presenters
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Ilan Rosen
Applied Physics, Stanford University, Stanford University
Authors
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Ilan Rosen
Applied Physics, Stanford University, Stanford University
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Indra Yudhistira
National University of Singapore
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Girish Sharma
National University of Singapore
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Maryam Salehi
Rutgers, the State University of New Jersey, Materials Science and Engineering, Rutgers, The State University of New Jersey, Materials Sci. & Eng., Rutgers University, Rutgers University, New Brunswick, Rutgers University, Rutgers University - New Brunswick
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Jisoo Moon
Rutgers, the State University of New Jersey, Department of Physics and Astronomy, Rutgers, the State University of New Jersey, Physics and Astronomy, Rutgers, The State University of New Jersey, Rutgers University, Rutgers University, New Brunswick
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Deepti Jain
Rutgers, the State University of New Jersey, Physics, Rutgers University, Rutgers University, New Brunswick, Rutgers University
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Seongshik Oh
Rutgers, the State University of New Jersey, Center for Quantum Materials Synthesis and Department of Physics and Astronomy, Rutgers, the State University of New Jersey, Physics and Astronomy, Rutgers, The State University of New Jersey, Physics, Rutgers University, Physics, Rutgers, The State University of New Jersey, Rutgers University, Rutgers University - New Brunswick
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Marc Kastner
Stanford University
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Shaffique Adam
Department of Physics and Centre for Advanced 2D Materials, National University of Singapore, Centre for Advanced 2D Materials and Graphene Research Centre, National University of Singapore, Department of Physics, National University of Singapore, Yale-NUS College, National University of Singapore
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David Goldhaber-Gordon
Stanford University, Department of Physics, Stanford University, Stanford University, USA, Physics, Stanford University