Gate-controlled charge-doping of a Mott insulator in Graphene/α-RuCl3 Heterostructures
ORAL
Abstract
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Presenters
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Boyi Zhou
Washington University, St. Louis, Department of Physics, Washington University in St. Louis
Authors
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Boyi Zhou
Washington University, St. Louis, Department of Physics, Washington University in St. Louis
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Jesse Balgley
Washington University, St. Louis
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Paula J Kelley
University of Tennessee (Knoxville, USA), Oak Ridge National Lab, Oak Ridge National Laboratory
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David George Mandrus
Department of Materials Science and Engineering, University of Tennessee, Knoxville, Tennessee 37996, USA, University of Tennessee-Knoxville, Oak Ridge National Lab, Department of Materials Science and Engineering, University of Tennessee, University of Tennessee (Knoxville, USA), Department of Materials Science and Engineering, University of Tennessee Knoxville, Department of Material Science & Engineering, University of Tennessee, Material Science and Engineering, University of Tennessee, Materials Science and Technology, Materials Science and Technology, University of Tennessee, Knoxville, Department of Materials Science and Engineering, The University of Tennessee, Materials Science and Engineering, The University of Tennessee, Oak Ridge National Laboratory, Department of Material Science and Engineering, University of Tennessee
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Erik Henriksen
Department of Physics, Washington University in St. Louis, 1 Brookings Dr, St. Louis, MO 63130, Washington University in St. Louis, Washington Univ, Physics, Washington University, St. Louis, Washington University, St. Louis, Department of Physics, Washington University in St. Louis