Charge Doping and Quantum Monte Carlo of NiO

ORAL

Abstract

NiO is a Mott insulator that orders antiferromagnetically below 520 K1. The transition temperature drops with Li-doping and becomes first ferrimagnetic and later antiferromagnetic with a Néel temperature of 9 K2. Despite intense study of NiO and other Mott insulators, the evolution of correlations with charge doping, which give rise to spectacular phenomena (including superconductivity in cuprates), is poorly understood to date. Here, we combine atomic layer-by-layer molecular beam epitaxy growth of charge doped NiO with density functional theory (DFT) and Quantum Monte Carlo (QMC) simulations. We analyze the band gap with spectroscopic ellipsometry as a function of hole (K) and electron (In) doping, and compare the results with DFT and QMC. Moreover, we measure the distortion of the lattice caused by the large K with extended x-ray absorption fine structure and find a distortion much larger than predicted by DFT.

1 D. Alders et al., EPL 32 (3), 259 (1995)
2 P. T. Barton et al., Chem. Eur. J. 19 (43), 14521 (2013)

Presenters

  • Friederike Wrobel

    Argonne National Laboratory

Authors

  • Friederike Wrobel

    Argonne National Laboratory

  • Changhee Sohn

    Materials Science and Technology Division, Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge National Lab, Materials Sciences and Technology Division, Oak Ridge National Laboratory, Oak Ridge National Laboratory

  • Hyeondeok Shin

    Computational Science Division, Argonne National Laboratory, Argonne National Laboratory

  • George Sterbinsky

    Advanced Photon Source, Argonne National Laboratory, Argonne National Laboratory

  • Anouar Benali

    Argonne National Laboratory, Computational Science Division, Argonne National Laboratory

  • Panchapakesan Ganesh

    Oak Ridge National Laboratory

  • Olle Heinonen

    Argonne National Laboratory, Materials Science Division, Argonne National Laboratory, Materials Science Division, Argonne National Laboratory, Lemont, Illinois, USA

  • Ho Nyung Lee

    Materials Science and Technology Division, Oak Ridge National Laboratory, Materials Sciences and Technology Division, Oak Ridge National Laboratory, Oak Ridge National Laboratory

  • Anand Bhattacharya

    Argonne National Laboratory, Materials Science Division, Argonne National Laboratory