Control of Topological Defects and Spontaneous Flows in Engineered Active Liquid Crystals

ORAL

Abstract

Active matter gives rise to intriguing spontaneous flows and motion whose collective behavior is difficult to steer and tailor, thereby placing limits on potential applications. Here, we present a new method to control the dynamics of an active liquid crystal. Theory shows that through the interplay of local active stresses it is possible to create anchoring effects that help confine activity-induced topological defects. This prediction is confirmed by hydrodynamic simulations of active nematics. Simulations further demonstrate that at moderate-to-high activity, local active stresses can be used to create defect pairs at will and direct the motion of +1/2 defects on demand; at low activity, such stresses can induce a spontaneous flow without strong elastic distortions of the nematic. Our calculations are compared to experiments of a flexible active liquid crystal.

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Presenters

  • Rui Zhang

    University of Chicago, Institute for Molecular Engineering, University of Chicago

Authors

  • Rui Zhang

    University of Chicago, Institute for Molecular Engineering, University of Chicago

  • Steven Redford

    University of Chicago, James Franck Institute, University of Chicago

  • Paul Ruijgrok

    Stanford University

  • Nitin Kumar

    University of Chicago

  • Ali Mozaffari

    University of Chicago

  • Aaron Dinner

    University of Chicago

  • Vincenzo Vitelli

    University of Chicago, Univ of Chicago, James Franck Institute and Department of Physics, University of Chicago, The James Franck Institute and Department of Physics, University of Chicago

  • Zev Bryant

    Stanford University

  • Margaret Gardel

    University of Chicago, Department of Physics, University of Chicago, Physics, The University of Chicago, James Franck Institute, University of Chicago

  • Juan De Pablo

    University of Chicago, Chemical Eng., University of Chicago, The Institute for Molecular Engineering, The University of Chicago, Institute for Molecular Engineering, University of Chicago, Institute for Molecular Engineering, The University of Chicago, Institute for Molecular Engineering, Argonne National Laboratory