Characterization of gate fidelities in a Si/SiGe two-qubit device
ORAL
Abstract
[1] T.F.Watson, et al, Nature 555, 633-637 (2018).
[2] J.Helsen, et al, arxiv:1806.02048.
[3] X.Xue, et al, manuscript in preparation.
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Presenters
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Xiao Xue
QuTech & Kavli Institute of Nanoscience, Delft University of Technology
Authors
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Xiao Xue
QuTech & Kavli Institute of Nanoscience, Delft University of Technology
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Thomas F Watson
QuTech and Kavli Institute of Nanoscience, Delft University of Technology, QuTech & Kavli Institute of Nanoscience, Delft University of Technology
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Jonas Helsen
QuTech, Delft University of Technology, Delft University of Technology
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Daniel Ward
Sandia National Laboratories, Sandia Natl Labs, University of Wisconsin-Madison
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Donald E Savage
University of Wisconsin-Madison, Department of Materials Science and Engineering, University of Wisconsin-Madison
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Max G Lagally
University of Wisconsin-Madison, University of Wisconsin, Department of Materials Science and Engineering, University of Wisconsin-Madison
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Susan Coppersmith
Department of Physics, University of Wisconsin-Madison, University of Wisconsin-Madison, University of Wisconsin - Madison
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Mark Alan Eriksson
Department of Physics, University of Wisconsin-Madison, University of Wisconsin-Madison, University of Wisconsin - Madison
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Stephanie Wehner
QuTech, Delft University of Technology, Delft University of Technology, Qutech, Delft University of Technology, TU Delft, Delft Univ of Tech, Delft University of Technology, QuTech
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Lieven Vandersypen
QuTech, TU Delft, QuTech and Kavli Institute of Nanoscience, Delft University of Technology, QuTech and Kavli Institute of NanoScience, TU Delft, Delft University of Technology, QuTech and Kavli Institute of Nanoscience, TU Delft, QuTech & Kavli Institute of Nanoscience, Delft University of Technology