Spectromicroscopic Analysis of Surface and Bulk Band Structure at a Disordered Topological Insulator Surface

ORAL

Abstract

The technique of angle resolved photoemission spectroscopy (ARPES) is widely applied to measure electronic band structures and has become central to our understanding of quantum material electronic structures over the last few decades. Recent improvements in coherent VUV light sources have driven rapid developments in the focused beam spot for ARPES, down to the d<10um diameter scale with little sacrifice, and the d~100nm scale with reduced flux. For this talk I will present ARPES spectromiscroscopy data which was used to map the surface band structure of a beam-sensitive topological insulator sample (disorder-enriched Bi2Se3). New data analysis methods are developed to obtain quantitative electronic structure information in spite of the flux sensitivity of the surface, revealing a complex structural environment in which fluctuations in the surface and bulk state energetics are found to be mostly decoupled.

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Presenters

  • Erica Kotta

    Physics, New York University, New York University

Authors

  • Erica Kotta

    Physics, New York University, New York University

  • Lin Miao

    Physics, New York University

  • Yishuai Xu

    Physics, New York University, New York University

  • Aaron Bostwick

    Advanced Light Source, E.O. Lawrence Berkeley National Lab, Berkeley, CA 94720, USA, Advanced Light Source, Lawrence Berkeley National Laboratory, ALS, Lawrence National Berkeley Laboratory, Advanced Light Source, Lawrence Berkeley National Lab, Lawrence Berkeley National Laboratory, Advanced Light Source (ALS), E. O. Lawrence Berkeley National Laboratory, USA, Advanced Light Source, E. O. Lawrence Berkeley National Laboratory

  • Chris Jozwiak

    Advanced Light Source, E.O. Lawrence Berkeley National Lab, Berkeley, CA 94720, USA, Advanced Light Source, Lawrence Berkeley National Laboratory, ALS, Lawrence National Berkeley Laboratory, Advanced Light Source, Lawrence Berkeley National Lab, Lawrence Berkeley National Laboratory, Lawrence Berkeley National Lab, Berkeley, USA, Advanced Light Source (ALS), E. O. Lawrence Berkeley National Laboratory, USA, Advanced Light Source, E. O. Lawrence Berkeley National Laboratory

  • Eli Rotenberg

    Advanced Light Source, E.O. Lawrence Berkeley National Lab, Berkeley, CA 94720, USA, Advanced Light Source, Lawrence Berkeley National Laboratory, ALS, Lawrence National Berkeley Laboratory, Advanced Light Source, Lawrence Berkeley National Lab, Lawrence Berkeley National Laboratory, Advanced Light Source (ALS), E. O. Lawrence Berkeley National Laboratory, USA, Advanced Light Source, E. O. Lawrence Berkeley National Laboratory

  • Takehito Suzuki

    MIT, Massachusetts Institute of Technology, Physics, Massachusetts Institute of Technology, Department of Physics, Massachusetts Institute of Technology

  • Joseph Checkelsky

    MIT, Massachusetts Institute of Technology, Physics, Massachusetts Institute of Technology, Department of Physics, Massachusetts Institute of Technology

  • Lewis A Wray

    Physics, New York University, New York University, Natron Energy