Josephson Junctions with Two-Dimensional van der Waals Tunnel Barrier
ORAL
Abstract
Better device structure and materials control have contributed to the performance improvement of the Al/AlOx/Al-based superconducting qubits, allowing the technology to initiate practical applications in quantum computing. However, one current limitation of such qubits is the use of amorphous alumina as the tunnel barrier, which is known to have defects that may compromise the qubit coherent time and performance stability. Here, we report novel Josephson Junctions with 2D van der Waals tunnel barriers made with stacked N-layer MoS2 that has minimal number of defects. We first generate a MoS2 membrane with controlled layer number N by vacuum stacking monolayer MoS2 as the tunneling barrier, and then depositing Al superconductor on either side to form the Josephson junctions. We show that we can reliably fabricate large numbers of Josephson junction devices on a single chip, and they show critical supercurrent that can be directly tuned by changing the N. We also characterize the microwave properties of Al/MoS2/Al junctions in a bulk superconducting cavity. Our work offers a new, powerful platform for generating and studying novel qubits with diverse 2D materials, and thus may provide an additional route to further improve the qubit performance for advancing the quantum technology.
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Presenters
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Kan-Heng Lee
The University of Chicago
Authors
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Kan-Heng Lee
The University of Chicago
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Srivatsan Chakram
The University of Chicago, University of Chicago
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Fauzia Mujid
Department of Chemistry, Institute for Molecular Engineering, and James Franck Institute, University of Chicago, The University of Chicago
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Chibeom Park
The University of Chicago
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Hui Gao
Department of Chemistry and Chemical Biology, Cornell University, The University of Chicago
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David Schuster
University of Chicago, The University of Chicago, Physics, University of Chicago, Department of Physics, University of Chicago
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Jiwoong Park
Department of Chemistry, Institute for Molecular Engineering, and James Franck Institute, University of Chicago, The University of Chicago