Nano-wire to Film Transitions During Pulsed-Laser Deposition: the Role of Plasma Plume Expansion

ORAL

Abstract

Due to their high conductivity, optical transparency, and high surface/volume ratio, indium-tin oxide (ITO) nanowires (NWs) are promising for flexible transparent electronics and gas sensors. During pulsed laser deposition (PLD) of ITO, NWs vs. films are typically selected via inert vs reactive atmospheres. In other studies, both NWs and films are observed during PLD in inert atmospheres.1 Here, we the consider the influence of the plasma plume expansion on NW vs film formation. For low pressure N2, we hypothesize that oxygen is strongly scattered, leaving a metal-rich plume, resulting in metal droplet formation, followed by vapor-liquid-solid growth of NW. As the N2 pressure is increased, the plasma plume and its metal rich core are compressed, resulting in a transition to films growth. This approach is likely applicable to a wide variety of metal-oxide NW core-shell structure for nanoscale devices.

1. R. Savu & E. Joanni, “Low-temperature, self-nucleated growth of indium–tin oxide nanostructures by pulsed laser deposition on amorphous substrates” Scripta Materialia 55, 979 (2006).

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Presenters

  • Davide Del Gaudio

    Materials Science and Engineering, University of Michigan, Department of Materials Science and Engineering, University of Michigan

Authors

  • Davide Del Gaudio

    Materials Science and Engineering, University of Michigan, Department of Materials Science and Engineering, University of Michigan

  • Carl T Boone

    SELFA

  • Kaitlyn Sallans

    Materials Science and Engineering, University of Michigan

  • Erica Mason

    University of Texas

  • Andrew Williamson

    Materials Science and Engineering, University of Michigan

  • Sneha Yarlagadda

    Materials Science and Engineering, University of Michigan

  • John Heron

    Materials Science and Engineering, University of Michigan, Department of Materials Science and Engineering, University of Michigan, Ann Arbor, University of Michigan

  • Ilan Shalish

    Electrical and Computer Engineering, Ben Gurion University

  • Rachel Goldman

    Materials Science and Engineering, university of Michigan, Materials Science and Engineering, University of Michigan, Materials Science & Engineering, University of Michigan - Ann Arbor, Department of Materials Science and Engineering, University of Michigan