Surface Loss Characterization and Comparison in Aluminum, Niobium, and Titanium Nitride Superconducting Resonators

ORAL

Abstract

Uniquely characterizing loss from two-level systems (TLS) at metal-substrate, metal-air, and substrate-air interfaces and in a dielectric substrate is challenging due to the nearly proportional scaling of the dielectric participations in response to changes in geometry and anisotropic trench depth. We developed a technique utilizing isotropic etching to assign a specific loss tangent to each dielectric, and use that to determine the dominant dielectric losses for a specific fabrication process, enabling targeted geometry and process changes to maximize performance. In this talk, we characterize the loss from high quality factor resonators (Qi>1M) for aluminum, titanium nitride, and niobium, and demonstrate the technique’s application by targeting specific defect layers to alter the dielectric losses specifically from these defect layers.

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Presenters

  • Alexander Melville

    MIT Lincoln Lab, MIT Lincoln Laboratory, Massachusetts Institute of Technology, Lincoln Laboratory, Massachusetts Institute of Technology, MIT Lincoln Laboratory, 244 Wood Street, Lexington, MA 02421, MIT Lincoln Laboratory, Massachusetts Institute of Technology

Authors

  • Alexander Melville

    MIT Lincoln Lab, MIT Lincoln Laboratory, Massachusetts Institute of Technology, Lincoln Laboratory, Massachusetts Institute of Technology, MIT Lincoln Laboratory, 244 Wood Street, Lexington, MA 02421, MIT Lincoln Laboratory, Massachusetts Institute of Technology

  • Greg Calusine

    MIT Lincoln Lab, MIT Lincoln Laboratory

  • Wayne Woods

    MIT Lincoln Lab, MIT Lincoln Laboratory, Massachusetts Institute of Technology

  • Evan Golden

    MIT Lincoln Lab, MIT Lincoln Laboratory

  • Jovi Miloshi

    MIT Lincoln Lab, MIT Lincoln Laboratory

  • Arjan Sevi

    MIT Lincoln Lab

  • Jonilyn L Yoder

    MIT Lincoln Lab, Lincoln Laboratory, Massachusetts Institute of Technology, MIT Lincoln Laboratory, Massachusetts Institute of Technology, Massachusetts Institute of Technology Lincoln Laboratory, Lincoln Lab, Massachusetts Institute of Technology, USA, MIT Lincoln Laboratory, 244 Wood Street, Lexington, MA 02421, MIT Lincoln Laboratory, Massachusetts Institute of Technology

  • William D Oliver

    Research Laboratory of Electronics, Massachusetts Institute of Technology, Department of Physics, Research Laboratory of Electronics, Lincoln Laboratory, Massachusetts Institute of Technology, MIT Lincoln Lab, MIT Lincoln Laboratory, Department of Physics, Massachusetts Institute of Technology, MIT Lincoln Laboratory, Massachusetts Institute of Technology, Research Laboratory of Electronics, Physics, Lincoln Laboratory, Massachusetts Institute of Technology, Department of Physics, Massachusetts Institute of Technology, Research Laboratory of Electronics, Massachusetts Institute of Technology, MIT Lincoln Laboratory, Physics, Massachusetts Institute of Technology, Dept. of Physics, Research Laboratory of Electronics, and Lincoln Lab, Massachusetts Institute of Technology, USA, Research Laboratory of Electronics, Department of Physics, Massachusetts Institute of Technology, Cambridge, MA 02139, MIT Lincoln Laboratory, 244 Wood Street, Lexington, MA, Massachusetts Institute of Technology and MIT Lincoln Laboratory, Research Laboratory of Electronics, MIT Lincoln Laboratory, Department of Physics, Massachusetts Institute of Technology, Department of Physics, Research Laboratory of Electronics, MIT Lincoln Laboratory, Massachusetts Institute of Technology, Department of Physics, MIT; Research Laboratory of Electronics, MIT; MIT Lincoln Laboratory