Atomic Layer Deposition of Titanium Nitride for Quantum Circuits

ORAL

Abstract

High kinetic inductance thin films are of great interest for superconducting detectors, coupling to hybrid systems, and novel superconducting qubits. We demonstrate that titanium nitride thin films grown via plasma-enhanced atomic layer deposition support superconducting microwave resonators with internal quality factors up to 1.0 million at single photon powers, and find that the dominant loss mechanism in these resonators is likely due to two-level systems. Utilizing nanowire geometries, we realize characteristic impedances greater than a resistance quantum with Z ~ 28 kΩ while maintaining low losses and a compact device footprint (8×8 μm2). The corresponding increase in zero point voltage fluctuations makes this material an excellent candidate for integration into hybrid quantum systems and quantum sensing.

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Presenters

  • Abigail Shearrow

    University of Chicago

Authors

  • Abigail Shearrow

    University of Chicago

  • Gerwin Koolstra

    University of Chicago

  • Samuel Whiteley

    University of Chicago, Institute for Molecular Engineering and Department of Physics, University of Chicago, Institute for Molecular Engineering, University of Chicago

  • Nathan D Earnest

    University of Chicago, The James Franck Institute and Department of Physics, University of Chicago

  • Peter Barry

    Kavli Institute for Cosmological Physics, University of Chicago, University of Chicago

  • Joseph Heremans

    Argonne National Laboratory, Materials Science Division, Argonne National Laboratory, Ohio State University

  • David Awschalom

    University of Chicago, Institute for Molecular Engineering, University of Chicago

  • Erik Shirokoff

    Department of Astronomy and Astrophysics, University of Chicago, University of Chicago

  • David Schuster

    University of Chicago, The University of Chicago, Physics, University of Chicago, Department of Physics, University of Chicago