Optical Direct-Write Lithography of Shadow Mask Josephson Junctions

We have developed a technique to fabricate Josephson junctions with a direct-write laser lithography system, enabling fast writing of large-area patterns. Using standard Niemeyer-Dolan bridge shadow deposition techniques, we create relatively large junctions (0.5 um^2) suitable for array-based parametric amplifiers. We explore fabrication techniques to create low critical current junctions for superconducting qubits. We present results on reproducibility and performance of Josephson parametric amplifiers and transmon qubits utilizing these junctions.