Interplay between flexoelectric and thermoelectric effects in bismuth telluride thin films

ORAL

Abstract

Flexoelectricity is a phenomena for which a strain gradient induces an internal polarization in semiconductor and dielectric materials. This effect can be used to enhance thermoelectric properties, and to enable the collection of photo-generated carriers without the need of a p-n junction. In this context, flexoelectricity was claimed to be the reason behind the variation of Seebeck coefficient in bismuth telluride (Bi2Te3) thin films deposited on different substrates, and was shown in many materials under illumination. However, a clear explanation of the relation between the applied strain and the detected signal is still missing, along with a comprehensive theoretical and experimental analysis.
We will present the experimental demonstration of flexoelectric effect in Bi2Te3 thin films deposited on flexible substrates, by magnetron sputtering. We will show and discuss how the open circuit voltage in our samples can be varied as a function of applied strain, temperature, and illumination level. Our results help to shed light on the relation between applied strain, material polarization, and the thermo/photoelectric performance, revealing new possible applications of the flexoelectric effect in low-gap materials.

Presenters

  • Bruno Lorenzi

    Mechanical Engineering, Massachusetts Institute of Technology

Authors

  • Bruno Lorenzi

    Mechanical Engineering, Massachusetts Institute of Technology

  • Svetlana Boriskina

    Mechanical Engineering, Massachusetts Institute of Technology

  • Akihiro Kobayashi

    Department of Materials Science, Tokai University

  • Masayuki Takashiri

    Department of Materials Science, Tokai University

  • Gang Chen

    Department of Mechanical Engineering, Massachusetts Institute of Technology, Mechanical Engineering, Massachusetts Institute of Technology, Massachusetts Institute of Technology