Fabrication of Dual Nanopatterns at desired area using Block Copolymer Containing Photocleavable Linker

Block copolymers (BCPs) with various nanodomains, such as spheres, cylinders, and lamellae, have received attention for their nanolithography application. However, those microdomains are determined by the volume fraction of one block. Meanwhile, nanopatterns with multiple shapes are required for the next-generation nanolithography. Although various methods have been reported to achieve dual nanopatterns, all the methods need sophisticated processes using E-beam. Here, we synthesized two kinds of BCP, linear and miktoarm typed BCP, containing o-nitrobenzyl alcohol(ONB) as photo-cleavable linker. In the case of linear BCP, dual nanopatterns consisting of nano-dots and nano-hole were easily fabricated by changing the wavelength of ultraviolet (UV) light. We also fabricated dual nanopatterns consisting of dots and lines at desired regions on a single substrate using miktoarm typed BCP.