Thermal effect on domain wall roughness in epitaxial PbZr0.2Ti0.8O3 thin films with different as-grow polarization orientations

ORAL

Abstract

In epitaxial ferroelectric films, the asymmetric boundary condition can lead to strong polarization asymmetry that affects the thermal stability of different polar states. We have carried out piezo-response force microscopy (PFM) studies on the thermal evolution of domain walls (DW) in epitaxial 50 nm PbZr0.2Ti0.8O3 (PZT) films grown on (La,Sr)MnO3 and LaNiO3 buffered SrTiO3, which show different as-grown polarization. We wrote stripe-domains and identified the DWs from the PFM images. The correlation function of the DW roughness depends on the distance L along the DW as L2ζ. At room temperature, the roughness exponent ζ is 0.2-0.3, consistent with 2D DWs in weak random bond disorder. The films were then heated at progressively higher temperatures till approaching TC. The subsequent PFM images show that ζ gradually increases to ~0.6, evolving to dominant thermal roughening. Both the bottom electrode type and the as-grown polarization orientation affect the T-dependence of ζ. We also compare the results obtained from in situ high temperature measurements and rapid thermal quench. Our study provides critical information about the thermal stability and size scaling limit of epitaxial thin films-based ferroelectric devices.

Presenters

  • Kun Wang

    Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln

Authors

  • Kun Wang

    Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln

  • Jingfeng Song

    Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln

  • Le Zhang

    Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska - Lincoln

  • Xuegang Chen

    Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska - Lincoln, Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln

  • Xia Hong

    Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska - Lincoln, Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Univ of Nebraska - Lincoln