Suppressing metallicity of topological insulator GdBi thin films by quantum confinement
ORAL
Abstract
[1] M. Zeng and C. Fang et al., arXiv:1504.03492 (2015). [2] X. Duan et al., arXiv:1802.04554 (2018).
–
Presenters
-
Hisashi Inoue
Massachusetts Institute of Technology, Geballe Laboratory for Advanced Materials, Department of Applied Physics, Stanford University
Authors
-
Hisashi Inoue
Massachusetts Institute of Technology, Geballe Laboratory for Advanced Materials, Department of Applied Physics, Stanford University
-
Minyong Han
Massachusetts Institute of Technology
-
Mengli Hu
Hong Kong University of Science and Technology, The Hong Kong University of Science and Technology
-
Takehito Suzuki
MIT, Massachusetts Institute of Technology, Physics, Massachusetts Institute of Technology, Department of Physics, Massachusetts Institute of Technology
-
Liang Fu
Massachusetts Institute of Technology, MIT, Department of Physics, Massachusetts Institute of Technology
-
Junwei Liu
Hong Kong University of Science and Technology, The Hong Kong University of Science and Technology, Department of Physics, Hong Kong University of Science and Technology
-
Joseph Checkelsky
MIT, Massachusetts Institute of Technology, Physics, Massachusetts Institute of Technology, Department of Physics, Massachusetts Institute of Technology