Growth and Characterization of Antiferromagnetic Rare-earth Bismuth thin films

ORAL

Abstract

Recent studies have shown that Rare-earth Bismuth (RBi) hosts topologically protected Dirac surface states [1,2]. However, spectroscopic measurements on bulk single crystals thus far have been limited to (001) natural cleavage surface of RBi. Here we report the first successful realization and characterization of GdBi (111) films grown on BaF2 substrates with Molecular Beam Epitaxy. GdBi, in a bulk form, is a semimetal with type-II antiferromagnetic (AFM) order below TN,bulk = 28 K. With torque magnetometry, we confirm that type-II AFM order is preserved in our films with a Neel temperature TN,film = 30 K. From electrical transport measurements, we observe a non-linear Hall effect and non-saturating magnetoresistance, the characteristics of a compensated semimetallic electronic structure. Stabilization of GdBi (111) films enables previously unexplored studies of the interplay of symmetry-breaking and Dirac crossings on the (111) surface of RBi. We further anticipate a possible Chern insulator phase in the ultrathin limit, when quantum confinement lifts semimetallicity while retaining non-trivial band topology. Reference: [1] M. Zeng and C. Fang et al., arXiv:1504.03492 (2015), [2] J. Nayak et al., Nat. Comm. 8, 13942 (2017).

Presenters

  • Minyong Han

    Massachusetts Institute of Technology

Authors

  • Minyong Han

    Massachusetts Institute of Technology

  • Hisashi Inoue

    Massachusetts Institute of Technology, Geballe Laboratory for Advanced Materials, Department of Applied Physics, Stanford University

  • Mengli Hu

    Hong Kong University of Science and Technology, The Hong Kong University of Science and Technology

  • Takehito Suzuki

    MIT, Massachusetts Institute of Technology, Physics, Massachusetts Institute of Technology, Department of Physics, Massachusetts Institute of Technology

  • Liang Fu

    Massachusetts Institute of Technology, MIT, Department of Physics, Massachusetts Institute of Technology

  • Junwei Liu

    Hong Kong University of Science and Technology, The Hong Kong University of Science and Technology, Department of Physics, Hong Kong University of Science and Technology

  • Joseph Checkelsky

    MIT, Massachusetts Institute of Technology, Physics, Massachusetts Institute of Technology, Department of Physics, Massachusetts Institute of Technology