Non-Gaussian resistance noise behavior across the metal-insulator transition in VO2 thin films

ORAL

Abstract

Vanadium dioxide (VO2) thin films exhibit a sharp metal-insulator transition (MIT) at a critical temperature ~ 330 K. The significance of a Peierls-type instability or a Mott-Hubbard-type transition near Tc has been a topic of discussion for many years. We present results from a resistance noise spectroscopy study of VO2 thin films that show that the power spectral density (PSD) of the fluctuations near Tc show a marked deviation from the metallic and insulating phases. The PSD increases by orders of magnitude and deviates from a typical 1/f behavior near Tc. The probability density function (PDF) of the fluctuation is non-Gaussian in nature in thin films near Tc whereas the fluctuations are Gaussian at all temperatures in single crystal nanobeams. Our results suggest that the transition likely occurs as a single domain phenomenon in nanobeams whereas the nucleation and propagation of multiple domains of opposite phase are significant near Tc in thin films. The influence of the coexistence of phases on electrical transport will be discussed based on our analysis of the 1/f behavior, PSD, PDF and the second spectrum of noise.

Presenters

  • Ahmed Ali

    Physics, University at Buffalo

Authors

  • Ahmed Ali

    Physics, University at Buffalo

  • Dasharath Adhikari

    Physics, University at Buffalo

  • Colin P Kilcoyne

    Physics, University at Buffalo

  • Sambandamurthy Ganapathy

    Physics, University at Buffalo