Electronic structure of Cr<sub>1/3</sub>NbSe<sub>2</sub> epitaxial thin films studied by angle-resolved photoemission spectroscopy

ORAL

Abstract

In transition metal dichalcogenide (TMD), intercalation of 3d-transition metal atoms has been widely studied due to the presence of magnetic phases with varied spin-ordering structures. Recently, the role of intercalation has been revisited in the lens of topological physics, as the ferromagnetic phase of 3d-transition metal intercalated Nb and Ta dichalcogenide (space group: P6322) have been predicted to host topological band crossing [1]. Within the intercalated TMD, Cr-intercalated niobium diselenide (CrxNbSe2) is one such example, which for x=1/3 the material develops a ferromagnetic ground-state [2]. In this work, we employed molecular-beam epitaxy (MBE) to obtain highly ordered Cr1/3NbSe2 epitaxial thin-films. We focused on clarifying the electronic structure of the Cr1/3NbSe2 epitaxial thin-films via angle-resolved photoemission spectroscopy (ARPES). By comparing the result with the first principles band calculation, the role of Cr intercalation to the electronic structure and topological features of the material is investigated.

 

References

1. T. Inoshita et al. Phys. Rev. B 100, 121112 (2019).

2. N. M. Toporova et al. J. Alloys Compd. 848, 156534 (2020).

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Presenters

  • Bruno S Kenichi

    • Department of Applied Physics, University of Tokyo
    • The University of Tokyo

Authors

  • Bruno S Kenichi

    • Department of Applied Physics, University of Tokyo
    • The University of Tokyo

  • Satoshi Hamao

    • Department of Applied Physics, University of Tokyo

  • Hideki Matsuoka

    • RIKEN

  • Masaki Nakano

    • The University of Tokyo

  • Miho Kitamura

    • Photon Factory, Institute of Materials Structure Science, High Energy Accelerator Research Organization

  • Masato Sakano

    • Department of Applied Physics, University of Tokyo

  • Takuya Nomoto

    • Department of Applied Physics, University of Tokyo
    • Univ of Tokyo

  • Motoaki Hirayama

    • RIKEN
    • Univ of Tokyo; RIKEN

  • Koji Horiba

    • Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University

  • Hiroshi Kumigashira

    • Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University

  • Ryotaro Arita

    • Department of Applied Physics, University of Tokyo
    • Univ. of Tokyo
    • Univ of Tokyo; RIKEN

  • Yoshihiro Iwasa

    • Univ of Tokyo

  • Kyoko Ishizaka

    • Department of Applied Physics, University of Tokyo
    • the Univeristy of Tokyo