Molecular beam epitaxy growth of SmB6 thin films
ORAL
Abstract
The majority of previous studies of SmB6 have investigated bulk crystals. However, the synthesis of epitaxial thin films presents new opportunities to tailor the surface termination, orientation, and strain, which may alter the behavior of the topologically non-trivial surface state.
In this work we use molecular beam epitaxy to grow sub-50 nm thick films of SmB6 on (001) and (111)-oriented silicon and germanium substrates. We use ex-situ x-ray diffraction to characterize the structure of the films and the impact of the substrate material and orientation. In addition, transport measurements of the films reveal a resistance plateau below around 10 K, consistent with both bulk samples and thin films reported in the literature. This work provides a platform to study the exotic ground states in strongly correlated materials.
* This work is supported by the Air Force Office of Scientific Research's (AFOSR) Multidisciplinary University Research Initiative (MURI) through Award No. FA9550-21-1-0429
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Presenters
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Anjolaoluwa Bamtefa
Harvard University
Authors
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Anjolaoluwa Bamtefa
Harvard University
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Jason D Hoffman
Harvard University, Harvard
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Sandesh S Kalantre
Stanford Institute for Materials and Energy Sciences, Stanford University Physics Department, Stanford University
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Molly P Andersen
Stanford University, Department of Physics, Stanford University, Stanford, California
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David Goldhaber-Gordon
Stanford University, Stanford Institute for Materials and Energy Sciences, Stanford University Physics Department, Department of Physics, Stanford University, Stanford, California, Stanford Institute for Materials & Energy Sciences, Stanford University
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Jennifer E Hoffman
Harvard University