Doping-Induced Tuning of Ultrasharp Exciton Emission in NiPS3: Unveiling Sensitivity to Spin-Structure Interplay.
ORAL
Abstract
Metal phosphorus trichalcogenides (MPX3, M = Mn, Fe, Ni; X = S, Se) have gained prominence in spintronics and quantum technologies. In particular, NiPS3 emitting a sharp photoluminescence (PL) peak at 1.476 eV, which is attributed to the spin-orbit entangled exciton (SO-X) state, has generated a lot of excitement recently. We examined Ni1-xMnxPS3 and NiPS3-ySey compounds to understand how changes in magnetic order affect this SO-X emission. Increasing Mn impurity concentration from 0 to 22% leads to a reduction in the intensity of SO-X and broadening of the linewidth from 0.4 to 4.2 meV. Whereas Se doping introduced a new PL peak at 1.472 eV, and also broadened the linewidth of SO-X emission. Notably, the sharp peak disappeared beyond x or y of 0.2. Furthermore, we analyzed the polarization-resolved PL of Ni1-xMnxPS3 alloys. At 5 K, increase of Mn concentration leads to decrease in degree linear polarization. In parallel, Raman spectroscopy of Ni1-xMnxPS3 revealed the two magnon scattering peak, a key indicator of correlated antiferromagnetism in NiPS3, exhibited a shift towards lower energies and suppression when x is increased from 0 to 0.2. This correlates with our findings in the PL spectrum further underscores the pivotal role of Mn impurities in disrupting the AFM order of NiPS3 system. This study unveils the interplay between impurity induced disruption in spin structures and PL and Raman characteristics in NiPS3, shedding light on their potential for future application.
*This research was primarily supported by Quantum Science Center, a National QIS Research Center. All the optical experiments are conducted at the Center for Integrated Nanotechnologies, a DOE BES user facility.
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Publication:[1] S. Kang, et al. Nature 583, 785 (2020). [2] X. Wang, et al. Nat. Mater. 20, 964 (2021). [3] R. Basnet, et al. Phys. Rev. Mater. 5, 064413 (2021)
Presenters
Tai C Trinh
Los Alamos National Laboratory
Authors
Tai C Trinh
Los Alamos National Laboratory
Rabindra Basnet
University of Arkansas, University of Arkansas at Pine Bluff
Vigneshwaran Chandrasekaran
Los Alamos National Laboratory
Dinesh Upreti
University of Arkansas
Rijan Karkee
UC Merced
Michael T Pettes
Los Alamos National Laboratory
Andrew Jones
Los Alamos National Laboratory
Jin Hu
University of Arkansas
Han Htoon
Los Alamos National Laboratory, Los Alamos Natl Lab