Resonant tunneling detection of atomic reconstruction in twisted bilayer WSe2

ORAL

Abstract

In twisted bilayer WSe2 (tBL-WSe2) at low twist angles, atomic reconstruction is driven based on moiré periodicity. In this study, we perform resonant tunneling measurements and transmission electron microscopy (TEM) observations for tBL-WSe2 samples with various twist angles θBL from 0° to 34°, and reveal the connection between atomic reconstruction and the resulting Γ-point band energy landscape. The resonant tunneling results consistently indicate the presence of two peak currents associated with tunneling into VB-Γ-point states of tBL-WSe2, regardless of the twist angle. As the twist angle increases from θBL = 0°, the energy spacing between these peaks decreases from ~0.7 eV and stabilizes at approximately ~0.6 eV for θBL ≥ 6°. In comparison, the TEM observations show atomic reconstruction patterns persisting up to θBL ~ 5°. It is worth noting that the energy spacing of the VB-Γ-point is significantly influenced by the interlayer distance of WSe2. Therefore, we have shown that we can detect atomic reconstruction in tBL-WSe2 through the changes in interlayer distance, which alter the resonant tunneling behavior into the VB-Γ-point states.

Presenters

  • Kei Kinoshita

    Institute of Industrial Science, University of Tokyo

Authors

  • Kei Kinoshita

    Institute of Industrial Science, University of Tokyo

  • Rai Moriya

    Institute of Industrial Science, University of Tokyo

  • Momoko Onodera

    Institute of Industrial Science, University of Tokyo

  • Shota Okazaki

    Laboratory for Materials and Structures, Tokyo Institute of Technology

  • Yung-Chang Lin

    National Institute of Advanced Industrial Science and Technology

  • Yijin Zhang

    Institute of Industrial Science, University of Tokyo

  • Satoru Masubuchi

    Univ of Tokyo, Institute of Industrial Science, University of Tokyo

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, Research Center for Electronic and Optical Materials, National Institute for Materials Science, Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, National Institute for Material Science

  • Takashi Taniguchi

    Kyoto Univ, National Institute for Materials Science, Research Center for Materials Nanoarchitectonics, Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, National Institute for Materials Sciences, NIMS, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, National Institute for Material Science, International Center for Materials Nanoarchitectonics, NIMS, Japan, International Center for Materials Nanoarchitectonics, Tsukuba, National Institue for Materials Science, Kyoto University, National Institute of Materials Science, International Center for Materials Nanoarchitectonics and National Institute for Materials Science

  • Ryosuke Senga

    National Institute of Advanced Industrial Science and Technology

  • Kazu Suenaga

    The Institute of Scientific and Industrial Research, Osaka University

  • Takao Sasagawa

    Tokyo Institute of Technology, Tokyo Inst of Tech - Yokohama, Laboratory for Materials and Structures, Tokyo Institute of Technology

  • Tomoki Machida

    Univ of Tokyo, Institute of Industrial Science, University of Tokyo