Chemical potential evolution of a doped Mott insulator in a semiconductor moiré lattice

ORAL

Abstract

Intriguing correlated electronic phases arise when electron or hole-like carriers are doped to a Mott insulator, an interaction-driven insulating phase that occurs at half-filling of an electronic band. The emergence of semiconductor moiré materials opens promising new avenues for exploring doped Mott-Hubbard systems, as the doping density of these two-dimensional materials can be precisely controlled through electrostatic gating. In this talk, I will describe direct chemical potential measurements of a prototypical moiré lattice system that realizes a Mott insulating phase at moiré filling factor ν = -1. Using a scanning single-electron transistor, we acquire local information on the chemical potential evolution across the Mott gap as a function of doping, as well as how the gap size depends on experimental tuning parameters such as magnetic field. I will discuss how these thermodynamic measurements inform our understanding of the doped Mott insulators in semiconductor moiré systems.

* This work was supported by NSF-DMR-2103910 and by QSQM, an Energy Frontier Research Center funded by the U.S. Department of Energy (DOE), Office of Science, Basic Energy Sciences (BES), under award no. DE-SC0021238. Z.Z. is supported by a Stanford Science fellowship.

Presenters

  • Jiachen Yu

    Princeton University

Authors

  • Jiachen Yu

    Princeton University

  • Carlos R Kometter

    Stanford University

  • Ziyan Zhu

    Stanford University

  • Takashi Taniguchi

    Kyoto Univ, National Institute for Materials Science, Research Center for Materials Nanoarchitectonics, Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, National Institute for Materials Sciences, NIMS, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, National Institute for Material Science, International Center for Materials Nanoarchitectonics, NIMS, Japan, International Center for Materials Nanoarchitectonics, Tsukuba, National Institue for Materials Science, Kyoto University, National Institute of Materials Science, International Center for Materials Nanoarchitectonics and National Institute for Materials Science

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, Research Center for Electronic and Optical Materials, National Institute for Materials Science, Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, National Institute for Material Science

  • Brian Moritz

    SLAC National Accelerator Laboratory

  • Thomas P Devereaux

    Stanford University

  • Ben Feldman

    Stanford University