Morphology manipulation in block copolymer films by reversible metal infiltration
ORAL
Abstract
Block copolymers (BCPs) are enablers of nanofabrication and pattern transfer processes owing to the ordered nanoscale structures that they form by self-assembly. We show that the self-assembled structures of polystyrene-b-poly(2-vinylpyridine) (PS-b-P2VP) BCPs can be locked by infiltrating [PtCl4]2− from a HCl solution. Pt infiltrates the P2VP block, limiting chain mobility and therefore locking the microdomain structure against reorganization during a successive annealing process. The amount of Pt introduced into the P2VP increases with both metal precursor concentration and acid concentration, reaching 0.83 Pt atom per pyridine group. A reverse exfiltration process using a KOH + ethylenediaminetetraacetic acid disodium salt dihydrate (Na2EDTA) complexing solution unlocks the structure and allows the microdomains to reorganize in a subsequent annealing step, for example, annealing in a different solvent vapor to change the morphology. The reversibility of metal infiltration and the corresponding morphology locking and unlocking effect is validated by characterizing the morphological evolution during multi-step annealing, infiltration and exfiltration steps, and in a 3D structural design process in which multiple layers of PS-b-P2VP are assembled with different morphologies. Structural locking and unlocking via infiltrated metal diversifies the toolkit for BCP-enabled nanofabrication.
* We acknowledge a Postdoctoral Fellowship from Shanghai Jiao Tong University and support from NSF DMREF award 2218678.
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Publication: Ma, M.; Liu, R.; Su, T.; Sun, Z.; Ross, C. A. Reversible Morphology Locking via Metal Infiltration in a Block Copolymer. ACS Nano 2023, 17, 12225–12233.
Ma, M.; Ross, C. A. Three-Dimensional Morphology Manipulation in Block copolymers by reversible metal infiltration.
Presenters
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Mingchao Ma
Massachusetts Institute of Technology
Authors
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Mingchao Ma
Massachusetts Institute of Technology
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Runze Liu
Massachusetts Institute of Technology
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Tingyu Su
Massachusetts Institute of Technology
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Zehao Sun
Massachusetts Institute of Technology
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Caroline A Ross
Massachusetts Institute of Technology MI