Polarons in the emerging ultra-wide-band-gap semiconductor rutile GeO2

ORAL

Abstract

Polarons are quasiparticles that form when carriers spontaneously self-trap by deforming the lattice through the electron-phonon interaction. The formation of polarons can adversely affect the carrier-transport properites of semiconductors. Compared to their narrower-gap counterparts, ultra-wide-band-gap semiconductors typically exhibit heavier effective masses and reduced electronic screening, factors that can increase the propensity for self-trapping. Here, we investigate the polaronic properites of rutile GeO2, a semiconductor with an ultra-wide band gap of 4.5 eV that has recently been synthesized n-type and predicted to be p-type dopable. We comment on the impact of polaron formation on the transport properites of rutile GeO2, and examine its suitability for power-electronics applications.

* This research is supported by the Computational Materials Sciences Program funded by the US Department of Energy, Office of Science, Basic Energy Sciences, under award no. DE-SC0020129. This research used resources of the National Energy Research Scientific Computing Center, a DOE Office of Science User Facility supported by the Office of Science of the US Department of Energy under contract no. DE-AC02-05CH11231.

Presenters

  • Nick Pant

    University of Michigan, University of Texas at Austin

Authors

  • Nick Pant

    University of Michigan, University of Texas at Austin

  • Feliciano Giustino

    University of Texas at Austin, University of Texas