Local Capacitance Measurements of WSe2

ORAL

Abstract

We have developed a local capacitance technique using capacitively coupled electrodes to study the electronic properties of transition metal dichalcogenide materials. This approach does not rely on making ohmic contacts to the material and thus makes measurements at low temperature and low density possible presenting a significant advantage over conventional dc transport. Our local capacitance technique provides sensitivity to layer polarization in bilayer systems as the density and displacement field can be varied independently under the local measurement electrode. We have implemented our technique to study monolayer and bilayer WSe2 in which contact resistance has been a major impediment to transport measurements. In this talk, we will present the results of our local capacitance techniques down to low carrier densities (< 1012 cm-2) and temperatures and high magnetic fields.

* This work is supported by the Basic Energy Sciences Program of the Office of Science of the U.S. Department of Energy through contract no. FG02-08ER46514. S.A. is partially supported by NSF Graduate Research Fellowship Program via grant no. 1122374

Presenters

  • Jackson P Butler

    Massachusetts Institute of Technology

Authors

  • Jackson P Butler

    Massachusetts Institute of Technology

  • Samuel H Aronson

    Massachusetts Institute of Technology, Massachusetts Institute of Technology MI

  • Madisen A Holbrook

    Columbia University

  • Luke N Holtzman

    Columbia University

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, Research Center for Electronic and Optical Materials, National Institute for Materials Science, Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, National Institute for Material Science

  • Takashi Taniguchi

    Kyoto Univ, National Institute for Materials Science, Research Center for Materials Nanoarchitectonics, Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, National Institute for Materials Sciences, NIMS, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, National Institute for Material Science, International Center for Materials Nanoarchitectonics, NIMS, Japan, International Center for Materials Nanoarchitectonics, Tsukuba, National Institue for Materials Science, Kyoto University, National Institute of Materials Science, International Center for Materials Nanoarchitectonics and National Institute for Materials Science

  • Katayun Barmak

    Columbia Univ, Columbia University

  • James C Hone

    Columbia University

  • Raymond C Ashoori

    Massachusetts Institute of Technology, Massachusetts Institute of Technology MIT