Charge-Transfer Contact to a High-Mobility Monolayer Semiconductor

ORAL

Abstract

Two-dimensional transition metal dichalcogenide (TMD) semiconductors have demonstrated tremendous potential for the development of highly tunable quantum devices. Nevertheless, realizing the potential of these materials requires low-resistance electrical contacts that perform well at the low temperatures and low densities where quantum properties are relevant. Here we present a new contact architecture for monolayer semiconductors that combines a charge-transfer layer and a contact metal to reach contact resistances as low as 20 kW mm at cryogenic temperatures. When applied to monolayer samples derived from high-purity bulk crystals, the polymer-free heterostructure fabrication allows for significantly higher mobility compared to previous generations of devices. The advances in contact quality and channel mobility enable the electronic transport study of strongly interacting quantum phases in monolayer semiconductors. Using these contacts in a monolayer WSe2 device, we observe a metal-to-insulator transition at low carrier density and transport signatures of the fractional quantum Hall effect under high magnetic fields.

* A portion of this work was performed at the National High Magnetic Field Laboratory, which is supported by National Science Foundation Cooperative Agreement No. DMR-2128556 and the State of Florida.

Presenters

  • Jordan Pack

    Columbia University

Authors

  • Jordan Pack

    Columbia University

  • Yinjie Guo

    Columbia University

  • Ziyu Liu

    Columbia University

  • Bjarke S Jessen

    Columbia University

  • Luke N Holtzman

    Columbia University

  • Song Liu

    Kansas State University, Columbia University

  • Matthew A Cothrine

    University of Tennessee

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, Research Center for Electronic and Optical Materials, National Institute for Materials Science, Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, National Institute for Material Science

  • Takashi Taniguchi

    Kyoto Univ, National Institute for Materials Science, Research Center for Materials Nanoarchitectonics, Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, National Institute for Materials Sciences, NIMS, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, National Institute for Material Science, International Center for Materials Nanoarchitectonics, NIMS, Japan, International Center for Materials Nanoarchitectonics, Tsukuba, National Institue for Materials Science, Kyoto University, National Institute of Materials Science, International Center for Materials Nanoarchitectonics and National Institute for Materials Science

  • David Mandrus

    University of Tennessee

  • Katayun Barmak

    Columbia Univ, Columbia University

  • James C Hone

    Columbia University

  • Cory R Dean

    Columbia Univ, Columbia University