Non-equilibrium charge dynamics in graphene-based devices encapsulated by boron nitride

ORAL

Abstract

Boron nitride (BN) encapsulation has become standard for creating ultra-high quality devices with van der Waals (vdW) materials. BN is generally assumed to be a featureless dielectric for the encapsulated vdW material, or a source of a moiré potential when rotationally aligned with graphene. However, in this work we show that non-equilibrium dynamics of charged defect states in BN can have a range of impacts on graphene-based device performance beyond what has been appreciated previously. In misaligned graphene/BN devices without a moiré, we find that charged defect states in BN can introduce hysteresis and telegraph noise in measurements of the resistance of the charge neutrality point, when transport is dominated by percolation through charge puddles. In other devices, we see an anomalous gate screening behavior that persists above room temperature and in structures as thick as bulk graphite. We find that the screening effect diminishes over timescales of days or longer, pointing to the possibility that defect-based trap states in the BN play an important role. We will discuss possible microscopic mechanisms, the potential role of introducing a moiré pattern, and the possibility of achieving new device functionalities by engineering defect states in BN.

* This work was supported by an appointment to the Intelligence Community Postdoctoral Research Fellowship Program at University of Washington administered by Oak Ridge Institute for Science and Education (ORISE) through an interagency agreement between the U.S. Department of Energy and the Office of the Director of National Intelligence (ODNI).

Presenters

  • Dacen Waters

    University of Washington

Authors

  • Dacen Waters

    University of Washington

  • Derek Waleffe

    University of Washington

  • Ellis Thompson

    University of Washington

  • Esmeralda Arreguin-Martinez

    University of Washington

  • Jordan M Fonseca

    University of Washington

  • Takashi Taniguchi

    Kyoto Univ, National Institute for Materials Science, Research Center for Materials Nanoarchitectonics, Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, National Institute for Materials Sciences, NIMS, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, National Institute for Material Science, International Center for Materials Nanoarchitectonics, NIMS, Japan, International Center for Materials Nanoarchitectonics, Tsukuba, National Institue for Materials Science, Kyoto University, National Institute of Materials Science, International Center for Materials Nanoarchitectonics and National Institute for Materials Science

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, Research Center for Electronic and Optical Materials, National Institute for Materials Science, Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, National Institute for Material Science

  • Xiaodong Xu

    University of Washington

  • David H Cobden

    University of Washington

  • Matthew Yankowitz

    University of Washington