Cryogenic radiation-hard fully-depleted silicon-on-insulator field-effect transistors
ORAL
Abstract
The radiation-hard transistors for space electronics need to operate at low temperatures and under irradiation by charged particles, x-rays, and gamma rays [1]. Fully-depleted silicon-on-insulator (FD-SOI) technologies, thanks to the small field-effect transistor (FET) volume, superior electrostatics, undoped channel, and threshold voltage VTH adjustability with back-biasing (BB), are more suitable for radiation hardness and low-temperature operations as compared to bulk CMOS FETs [2].
In this work, we irradiated our custom FD-SOI FETs [3] with 7.5 MeV protons for the total irradiation dose of 30 Mrad(Si), at the radiation-hard technology threshold [1]. Studying transfer/output characteristics and low-frequency current noise of irradiated FETs with different dimensions, we observed that introduced defects and impact of irradiation, which degrades FET's electrostatics, e.g. in terms of subthreshold swing and VTH, can be effectively mitigated through reverse BB (pushing the channel toward the top Si/SiO2 interface) from 293 K down to 4 K.
In summary, we demonstrate that our FD-SOI technology is a promising candidate for room temperature and cryogenic radiation-hard applications.
[1] IEEE Trans Nucl Sci, vol. 34, no.6, pp.1621-1628 (1987).
[2] IEEE Int. SOI Conf., Tempe, AZ, USA, pp.1-2 (2011).
[3] arXiv:2208.12131 (2022).
In this work, we irradiated our custom FD-SOI FETs [3] with 7.5 MeV protons for the total irradiation dose of 30 Mrad(Si), at the radiation-hard technology threshold [1]. Studying transfer/output characteristics and low-frequency current noise of irradiated FETs with different dimensions, we observed that introduced defects and impact of irradiation, which degrades FET's electrostatics, e.g. in terms of subthreshold swing and VTH, can be effectively mitigated through reverse BB (pushing the channel toward the top Si/SiO2 interface) from 293 K down to 4 K.
In summary, we demonstrate that our FD-SOI technology is a promising candidate for room temperature and cryogenic radiation-hard applications.
[1] IEEE Trans Nucl Sci, vol. 34, no.6, pp.1621-1628 (1987).
[2] IEEE Int. SOI Conf., Tempe, AZ, USA, pp.1-2 (2011).
[3] arXiv:2208.12131 (2022).
* We acknowledge support from EU Horizon 2020 project No.101113983, the Academy of Finland project No.350325, & Business Finland project No.128291.
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Publication: H. Bohuslavskyi, K. Helariutta, K. Tappura, and E. Tuominen, "Characterization of custom FD-SOI MOSFETs irradiated with 7.5 MeV protons from room temperature down to 4 K" in preparation (2023).
Presenters
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Heorhii Bohuslavskyi
VTT Technical Research Centre of Finland Ltd, VTT Technical Research Centre of Finland
Authors
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Heorhii Bohuslavskyi
VTT Technical Research Centre of Finland Ltd, VTT Technical Research Centre of Finland
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Kerttuli Helariutta
University of Helsinki
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Kirsi Tappura
VTT Technical Research Centre of Finland
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Eija Tuominen
VTT Technical Research Centre of Finland