Tuning the Structural and Optical Properties of Chromium Nitride Thin Films for Advanced Technological Applications
ORAL
Abstract
Abstract
Chromium nitride (CrN) exhibits interesting structural[1], magnetic[2], electronic[3], and optical[4] characteristics, positioning it as a potential contender for a wide range of advanced technological applications. This study delves deeply into the structural, electronic, and optical properties of chromium oxynitride thin films grown on Si (001) and fused silica substrates by a radiofrequency magnetron sputtering system. A thorough examination was conducted to investigate the effects of these growth parameters on their structural structure, charge transport properties, and band gap. The film composition was studied by x-ray photoelectron spectroscopy. Study shows the resistivity and band gap of the films are highly sensitive to the growth conditions. Notably, the Hall coefficient underwent a change in sign, transitioning from negative to positive based on the growth conditions, signifying a shift in the majority carrier from electrons to holes. Furthermore, the band gap exhibited a notable variation, ranging from 0.96 eV to 3.56 eV, a result of significant interest for potential photovoltaic applications. Notably, the band gap exhibited a significant shift, spanning from 0.96 eV to 3.56 eV, a result of considerable interest in the context of potential photovoltaic applications.
Acknowledgements
This work was supported by the Interdisciplinary Research Center for Renewable Energy and Power Systems of King Fahd University of Petroleum and Minerals, Dhahran, Saudi Arabia under grant No. INRE2216.
References
1. K. Alam, R. Ponce-Pérez, K. Sun, A. Foley, N. Takeuchi, and A. R. Smith, J. Vac. Sci. Technol. A 41, 053411 (2023).
2. K. Alam, S. M. Disseler, W. D. Ratcliff, J. A. Borchers, R. Ponce-Pérez, G. H. Cocoletzi, N. Takeuchi, A. Foley, A. Richard, and D. C. Ingram, Phys. Rev. B 96, 104433 (2017).
3. K. Alam, M. B. Haider, M. F. Al-Kuhaili, K. A. Ziq, and B. U. Haq, Ceram. Int. 48, 17352 (2022).
4. B. U. Haq, K. Alam, M. B. Haider, A. M. Alsharari, S. Ullah, and S.-H. Kim, Phys. E Low-Dimens. Syst. Nanostructures 150, 115697 (2023).
Chromium nitride (CrN) exhibits interesting structural[1], magnetic[2], electronic[3], and optical[4] characteristics, positioning it as a potential contender for a wide range of advanced technological applications. This study delves deeply into the structural, electronic, and optical properties of chromium oxynitride thin films grown on Si (001) and fused silica substrates by a radiofrequency magnetron sputtering system. A thorough examination was conducted to investigate the effects of these growth parameters on their structural structure, charge transport properties, and band gap. The film composition was studied by x-ray photoelectron spectroscopy. Study shows the resistivity and band gap of the films are highly sensitive to the growth conditions. Notably, the Hall coefficient underwent a change in sign, transitioning from negative to positive based on the growth conditions, signifying a shift in the majority carrier from electrons to holes. Furthermore, the band gap exhibited a notable variation, ranging from 0.96 eV to 3.56 eV, a result of significant interest for potential photovoltaic applications. Notably, the band gap exhibited a significant shift, spanning from 0.96 eV to 3.56 eV, a result of considerable interest in the context of potential photovoltaic applications.
Acknowledgements
This work was supported by the Interdisciplinary Research Center for Renewable Energy and Power Systems of King Fahd University of Petroleum and Minerals, Dhahran, Saudi Arabia under grant No. INRE2216.
References
1. K. Alam, R. Ponce-Pérez, K. Sun, A. Foley, N. Takeuchi, and A. R. Smith, J. Vac. Sci. Technol. A 41, 053411 (2023).
2. K. Alam, S. M. Disseler, W. D. Ratcliff, J. A. Borchers, R. Ponce-Pérez, G. H. Cocoletzi, N. Takeuchi, A. Foley, A. Richard, and D. C. Ingram, Phys. Rev. B 96, 104433 (2017).
3. K. Alam, M. B. Haider, M. F. Al-Kuhaili, K. A. Ziq, and B. U. Haq, Ceram. Int. 48, 17352 (2022).
4. B. U. Haq, K. Alam, M. B. Haider, A. M. Alsharari, S. Ullah, and S.-H. Kim, Phys. E Low-Dimens. Syst. Nanostructures 150, 115697 (2023).
* This work was supported by the Interdisciplinary Research Center for Renewable Energy and Power Systems of King Fahd University of Petroleum and Minerals, Dhahran, Saudi Arabia under grant No. INRE2216.
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Presenters
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kahn Alam
King Fahd University of Petroleum and Minerals
Authors
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kahn Alam
King Fahd University of Petroleum and Minerals
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Waheed S Kamoru
King Fahd University of Petroleum and Minerals
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Muhammad Baseer Haider
King Fahd University of Petroleum and Minerals
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Bakhtiar U Haq
Jeju national university, Jeju National University