Transition of localization of light to delocalization outside the disordered medium.

ORAL

Abstract

We have studied the evolution of localized light by probe microscopy (at second harmonic regime: λ~390 nm) created by disordered medium made of threading dislocations in GaAs thin films. Details of localized light was monitored from surface of the sample (~15 nm from sample) up to ~20 μm away from sample. Second harmonic optical probe microscopy information is shielded from the dominant surface fundamental reflection, providing undisturbed details of light localization transition and dispersion at deep subwavelength (with ~ 20 nm optical resolution). We observed that light becomes delocalized around ~12 μm away from surface of the sample where Anderson localization statistical signatures changes.

* Welch Foundation

Publication: -https://arxiv.org/abs/2211.02808
Observation of Fundamental Limit of Light Localization
-https://www.sciencedirect.com/science/article/pii/S0304399122001139
Collection of propagating electromagnetic fields by uncoated probe
-https://onlinelibrary.wiley.com/doi/full/10.1002/adom.202002252
Detection of Subsurface, Nanometer-Scale Crystallographic Defects by Nonlinear Light Scattering and Localization

Presenters

  • Farbod Shafiei

    University of Texas at Austin

Authors

  • Farbod Shafiei

    University of Texas at Austin

  • Tommaso Orzali

    SEMATECH

  • Alexey Vert

    SEMATECH

  • Man Hoi Wong

    SEMATECH

  • Gennadi Bersuker

    M2D Solutions

  • Michael C Downer

    University of Texas at Austin